Low <i>Q<sub>C</sub>V<sub>F</sub> </i> 20 A/1.4 kV <i>β</i>-Ga₂O₃ Vertical Trench High-k RESURF Schottky Barrier Diode With Turn-On Voltage of 0.5 V

We present a <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 Trench Schottky Barrier Diode (SBD) featuring a high-permittivity (high-k) dielectric RESURF and an atomic layer-deposited (ALD) Ru anode contact to engineer the trade-off between forward voltage drop and reverse leakage current. We created <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1~\mu {m}$ </tex-math></inline-formula> deep trenches on the lightly doped <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 drift layer and deposited a high-permittivity BaTiO3 as the RESURF dielectric. By encircling the trenches with the anode metal, the electric field at the metal/semiconductor junction is effectively reduced. Consequently, we were able to utilize a low work-function metal like Ru without inducing a significant increase in reverse leakage current. The high-k RESURF trench SBD, spanning an area of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${200}\times {200}~\mu {m}^{{2}}$ </tex-math></inline-formula>, demonstrated a low turn-on voltage of 0.5 V and a reverse breakdown voltage exceeding 3 kV, with a leakage current density of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$2~\textit {mA}/\textit {cm}^{{2}}$ </tex-math></inline-formula> at 3kV. The larger area <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${1}\times {1}~\textit {mm}^{{2}}$ </tex-math></inline-formula> and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${2}\times {2}~\textit {mm}^{{2}}$ </tex-math></inline-formula> devices exhibited breakdown voltages of 1.74kV and 1.42kV, respectively, while accommodating maximum pulsed forward currents of 6A and 20A, respectively. The devices presented here exhibit very low product of stored charge and forward voltage drop (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${Q}_{C}V_{F}$ </tex-math></inline-formula>) for <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\gt {1}$ </tex-math></inline-formula> A, 1 kV device, indicating promising switching and conduction loss trade-off for multi-kilovolt class applications.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2024-09-27
DOI
https://doi.org/10.1109/led.2024.3469283
Citations
18
Primary Topic
Ga2O3 and related materials
Type
article
Field-Weighted Citation Impact
2.12

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article

Low QCVF 20 A/1.4 kV β-Ga₂O₃ Vertical Trench High-k RESURF Schottky Barrier Diode With Turn-On Voltage of 0.5 V

Sriram Krishnamoorthy, Carl Peterson, Yizheng Liu, Jacqueline Cooke et al.
18 citations
IEEE Electron Device Letters
Ga2O3 and related materials
2.12
article

Low QCVF 20 A/1.4 kV β-Ga₂O₃ Vertical Trench High-k RESURF Schottky Barrier Diode With Turn-On Voltage of 0.5 V

Sriram Krishnamoorthy, Carl Peterson, Yizheng Liu, Jacqueline Cooke, Arkka Bhattacharyya, Saurav Roy, Berardi Sensale‐Rodriguez, Benjamin Kostroun
article en
18 citations

Abstract

We present a <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 Trench Schottky Barrier Diode (SBD) featuring a high-permittivity (high-k) dielectric RESURF and an atomic layer-deposited (ALD) Ru anode contact to engineer the trade-off between forward voltage drop and reverse leakage current. We created <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1~\mu {m}$ </tex-math></inline-formula> deep trenches on the lightly doped <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 drift layer and deposited a high-permittivity BaTiO3 as the RESURF dielectric. By encircling the trenches with the anode metal, the electric field at the metal/semiconductor junction is effectively reduced. Consequently, we were able to utilize a low work-function metal like Ru without inducing a significant increase in reverse leakage current. The high-k RESURF trench SBD, spanning an area of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${200}\times {200}~\mu {m}^{{2}}$ </tex-math></inline-formula>, demonstrated a low turn-on voltage of 0.5 V and a reverse breakdown voltage exceeding 3 kV, with a leakage current density of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$2~\textit {mA}/\textit {cm}^{{2}}$ </tex-math></inline-formula> at 3kV. The larger area <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${1}\times {1}~\textit {mm}^{{2}}$ </tex-math></inline-formula> and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${2}\times {2}~\textit {mm}^{{2}}$ </tex-math></inline-formula> devices exhibited breakdown voltages of 1.74kV and 1.42kV, respectively, while accommodating maximum pulsed forward currents of 6A and 20A, respectively. The devices presented here exhibit very low product of stored charge and forward voltage drop (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${Q}_{C}V_{F}$ </tex-math></inline-formula>) for <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\gt {1}$ </tex-math></inline-formula> A, 1 kV device, indicating promising switching and conduction loss trade-off for multi-kilovolt class applications.

IEEE Electron Device LettersVol. 45(12)
University of California, Santa Barbara (US), University of Utah (US)
Air Force Office of Scientific Research
Affordable and clean energy
Openalex Percentile: Top 12%
Ga2O3 and related materials
2.12
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