Spatial and Energetic Mapping of Traps in FeFET During Endurance Process by Advanced Trap Characterization Platform

Hafnium-based Ferroelectric Field-Effect Transistors (FeFETs) suffer from limited endurance. In-depth understanding of the trap behaviour during failure process is crucial for endurance improvement. In this work, aiming at the characteristics of FeFETs, Trap Spectroscopy by Charge Injection and Sensing (TSCIS) technique is optimized and an advanced trap characterization platform based on newly optimized TSCIS method combined with Low Frequency Noise (LFN) and C-V characteristics for resolving spatial and energetic distribution of traps in FeFETs is developed. Furthermore, through this advanced trap characterization platform, the trap behaviours of nitridation/non-nitridation FeFETs during endurance process are characterized and compared in detail. The improvement of interface quality by nitridation is finally confirmed from the defect level.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2024-09-27
DOI
https://doi.org/10.1109/led.2024.3469372
Citations
66
Primary Topic
Metal and Thin Film Mechanics
Type
article
Field-Weighted Citation Impact
17.77

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article

Spatial and Energetic Mapping of Traps in FeFET During Endurance Process by Advanced Trap Characterization Platform

Tiancheng Gong, Hongye Yuan, Yuanquan Huang, Pengfei Jiang et al.
66 citations
IEEE Electron Device Letters
Metal and Thin Film Mechanics
17.77
article

Spatial and Energetic Mapping of Traps in FeFET During Endurance Process by Advanced Trap Characterization Platform

Tiancheng Gong, Hongye Yuan, Yuanquan Huang, Pengfei Jiang, Junshuai Chai, Yuan Wang, Qing Luo, Xiaolei Wang, Yang Yang, Zhicheng Wu, Wei Wei
article en
66 citations

Abstract

Hafnium-based Ferroelectric Field-Effect Transistors (FeFETs) suffer from limited endurance. In-depth understanding of the trap behaviour during failure process is crucial for endurance improvement. In this work, aiming at the characteristics of FeFETs, Trap Spectroscopy by Charge Injection and Sensing (TSCIS) technique is optimized and an advanced trap characterization platform based on newly optimized TSCIS method combined with Low Frequency Noise (LFN) and C-V characteristics for resolving spatial and energetic distribution of traps in FeFETs is developed. Furthermore, through this advanced trap characterization platform, the trap behaviours of nitridation/non-nitridation FeFETs during endurance process are characterized and compared in detail. The improvement of interface quality by nitridation is finally confirmed from the defect level.

IEEE Electron Device LettersVol. 45(12)
Chinese Academy of Sciences (CN), Institute of Microelectronics (CN)
Youth Innovation Promotion Association of the Chinese Academy of Sciences
Affordable and clean energy
Openalex Percentile: Top 0%
Metal and Thin Film Mechanics
17.77
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Spatial and Energetic Mapping of Traps in FeFET During Endurance Process by Advanced Trap Characterization Platform — Tiancheng Gong, Hongye Yuan, et al. · IEEE Electron Device Letters (2024) | TGRS Research Map | TGRS