A SiC Trench Schottky Diode With Accelerated Hole Extraction and Recombination Structure for Enhancing Single-Event Burnout Tolerance
A SiC trench junction barrier Schottky diode with multiple P-shield layers and an embedded N+ region (MPNT-JBS) is proposed and investigated for enhancing single-event burnout (SEB) tolerance. The Schottky contact at the sidewall of the trench and the embedded N+ region in MPNT-JBS accelerate the extraction and recombination of holes. The mitigated accumulation of holes contributes to the reduction of the strong electric field near the metal/SiC interface, thus favoring a decrease in the high temperature. Under 50% of the rated voltage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$V_{\mathrm { Cathode}}{=}600$ </tex-math></inline-formula> V), the maximum temperature near the metal/SiC interface in MPNT-JBS decreases by 78% and 71% compared to SiC JBS diode with multilayer N-buffer (MB-JBS), corresponding to the instances when heavy ions with a linear energy transfer (LET) value of 0.53 pC/<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mu $ </tex-math></inline-formula> m strike the middle of the Schottky contact and the P+ region, respectively. In addition, the multilayer P-shield of MPNT-JBS suppresses the peak temperature near the PN junction by enlarging the energy dissipation area and lowering the transient heat power near the PN junction. Compared to MB-JBS, the maximum temperature near the PN junction in MPNT-JBS decreases from 1890 K to 1454 K when heavy ions strike the middle of the P+ region (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$V_{\mathrm { Cathode}}{=}600$ </tex-math></inline-formula> V). These results indicate that MPNT-JBS provides potential for enhancing SEB tolerance.
Authors
- Song Bai (ORCID: https://orcid.org/0000-0002-9563-3067)
- Xuan Li (ORCID: https://orcid.org/0000-0002-3052-0854)
- Xiaochuan Deng (ORCID: https://orcid.org/0000-0003-3816-4724)
- Bo Zhang (ORCID: https://orcid.org/0000-0003-1288-1549)
- Xu Li (ORCID: https://orcid.org/0000-0001-5671-000X)
- Rui Yang (ORCID: https://orcid.org/0009-0001-4093-062X)
- Yi Wen (ORCID: https://orcid.org/0000-0001-5599-1946)
- Haibo Wu (ORCID: https://orcid.org/0009-0005-9527-5916)
Institutions
- University of Electronic Science and Technology of China (CN)
Publication Details
- Journal
- IEEE Transactions on Device and Materials Reliability
- Published
- 2024-09-26
- DOI
- https://doi.org/10.1109/tdmr.2024.3468468
- Citations
- 4
- Primary Topic
- Radiation Effects in Electronics
- Type
- article
- Field-Weighted Citation Impact
- 0.83
Funders
- National Natural Science Foundation of China
- Key Programme
- Basic and Applied Basic Research Foundation of Guangdong Province