Effects of Thickness and Anisotropic Strain on Polarization Switching Properties of Sub-10nm Epitaxial Hf_0.5Zr_0.5O₂ Thin Films

Abstract Doped HfO 2 -based ferroelectric (FE) films are emerging as leading contenders for next-generation FE non-volatile memories due to their excellent compatibility with complementary metal oxide semiconductor processes and robust ferroelectricity at nanoscale dimensions. Despite the considerable attention paid to the FE properties of HfO 2 -based films in recent years, enhancing their polarization switching speed remains a critical research challenge. We demonstrate the strong ferroelectricity of sub-10 nm Hf 0.5 Zr 0.5 O 2 (HZO) thin films and show that the polarization switching speed of these thin films can be significantly affected by HZO thickness and anisotropically strained La 0.67 Sr 0.33 MO 3 -buffered layer. Our observations indicate that the HZO thin film thickness and anisotropically strained La 0.67 Sr 0.33 MO 3 layer influence the nucleation of reverse domains by altering the phase composition of the HZO thin film, thereby reducing the polarization switching time. Although the increase in HZO thickness and anisotropic compressive strain hinder the formation of the FE phase, they can enable faster switching. Our findings suggest that FE HZO ultrathin films with polar orthorhombic structures have broad application prospects in microelectronic devices. These insights into novel methods for increasing polarization switching speed are poised to advance the development of high-performance FE devices.