Physical mechanism of gettering of impurity Ni atom clusters in Si lattice

This article presents the gettering mechanism and the physical model of impurity Ni atom clusters in the Si crystal lattice. The study finds out that the formed Ni atom clusters lead to gettering various rapidly diffusing impurities, both present in the Si lattice and introduced, as well as oxygen atoms, by stimulating generation of recombination centers of thermal and radiation defects.

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Publication Details

Journal
Semiconductor Physics Quantum Electronics & Optoelectronics
Published
2024-09-20
DOI
https://doi.org/10.15407/spqeo27.03.294
Citations
3
Primary Topic
Advanced Materials Characterization Techniques
Type
article
Field-Weighted Citation Impact
0.55
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article

Physical mechanism of gettering of impurity Ni atom clusters in Si lattice

B. K. Ismaylov, N. F. Zikrillayev, К. А. Исмайлов, Z. T. Kenzhaev
3 citations
Semiconductor Physics Quantum Electronics & Optoelectronics
Advanced Materials Characterization Techniques
0.55
article

Physical mechanism of gettering of impurity Ni atom clusters in Si lattice

B. K. Ismaylov, N. F. Zikrillayev, К. А. Исмайлов, Z. T. Kenzhaev
article en
3 citations

Abstract

This article presents the gettering mechanism and the physical model of impurity Ni atom clusters in the Si crystal lattice. The study finds out that the formed Ni atom clusters lead to gettering various rapidly diffusing impurities, both present in the Si lattice and introduced, as well as oxygen atoms, by stimulating generation of recombination centers of thermal and radiation defects.

Semiconductor Physics Quantum Electronics & OptoelectronicsVol. 27(03)
Openalex Percentile: Top 37%
Advanced Materials Characterization Techniques
0.55
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