Physical mechanism of gettering of impurity Ni atom clusters in Si lattice
This article presents the gettering mechanism and the physical model of impurity Ni atom clusters in the Si crystal lattice. The study finds out that the formed Ni atom clusters lead to gettering various rapidly diffusing impurities, both present in the Si lattice and introduced, as well as oxygen atoms, by stimulating generation of recombination centers of thermal and radiation defects.
Authors
- B. K. Ismaylov (ORCID: https://orcid.org/0000-0002-5880-4568)
- N. F. Zikrillayev (ORCID: https://orcid.org/0000-0002-6696-5265)
- К. А. Исмайлов (ORCID: https://orcid.org/0009-0008-0559-5046)
- Z. T. Kenzhaev
Publication Details
- Journal
- Semiconductor Physics Quantum Electronics & Optoelectronics
- Published
- 2024-09-20
- DOI
- https://doi.org/10.15407/spqeo27.03.294
- Citations
- 3
- Primary Topic
- Advanced Materials Characterization Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.55