Computational vibration mitigation using phase interpolation in digital holographic microscopy for overlay metrology

Digital holographic microscopy retrieves amplitude and phase information of an image which allows us to computationally correct for imperfections in the imaging optics. However, digital holographic microscopy is an interferometric technique that is inherently sensitive to undesired phase variations between object and reference beam. These phase variations lower the fringe contrast if they are integrated over a finite exposure time which leads to a reduced amplitude of the retrieved image. This results in significant errors in applications that rely on a stable and accurate amplitude measurement, such as optical overlay metrology in the semiconductor industry. We present experimental results on a computational vibration mitigation method for the application of overlay metrology using phase interpolation between a sequence of measured holograms and demonstrate its capability to improve metrology precision in an overlay metrology application that uses digital holographic microscopy.

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Publication Details

Journal
Optics Express
Published
2024-09-16
DOI
https://doi.org/10.1364/oe.534958
Citations
3
Primary Topic
Digital Holography and Microscopy
Type
article
Field-Weighted Citation Impact
1.01

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Computational vibration mitigation using phase interpolation in digital holographic microscopy for overlay metrology

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Computational vibration mitigation using phase interpolation in digital holographic microscopy for overlay metrology

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article en
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Abstract

Digital holographic microscopy retrieves amplitude and phase information of an image which allows us to computationally correct for imperfections in the imaging optics. However, digital holographic microscopy is an interferometric technique that is inherently sensitive to undesired phase variations between object and reference beam. These phase variations lower the fringe contrast if they are integrated over a finite exposure time which leads to a reduced amplitude of the retrieved image. This results in significant errors in applications that rely on a stable and accurate amplitude measurement, such as optical overlay metrology in the semiconductor industry. We present experimental results on a computational vibration mitigation method for the application of overlay metrology using phase interpolation between a sequence of measured holograms and demonstrate its capability to improve metrology precision in an overlay metrology application that uses digital holographic microscopy.

Optics ExpressVol. 32(21)
Vrije Universiteit Amsterdam (NL), ASML (Netherlands) (NL)
Rijksuniversiteit Groningen, Universiteit van Amsterdam, Vrije Universiteit Amsterdam, Nederlandse Organisatie voor Wetenschappelijk Onderzoek, ASML
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Digital Holography and Microscopy
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