Study of the Impact of RDF on n-Type SOI Nanowire FET via Quantum-Corrected Monte Carlo Device Simulations

This article investigates the impact of random dopant fluctuation (RDF) on the current of a n-type nanowire silicon on insulator (SOI) triple-gate transistor. This study was performed employing a quantum-corrected Monte Carlo (MC) device simulator that was successfully assessed by comparing the simulation characteristics curves with experimental data. The results demonstrate that the impact of a single dopant atom on the transistor’s current depends on the dopant position along the channel length, fin height, and width. A random dopant in the channel affects the electrostatics, the electron density, and the electron mobility, thus degrading the transistor current. The study was performed for <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {GS}} = {0.5}$ </tex-math></inline-formula> V, and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}} = {0.2}$ </tex-math></inline-formula> V, <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}} = {0.5}$ </tex-math></inline-formula> V, and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}} = {0.7}$ </tex-math></inline-formula> V. For <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}} = {0.2}$ </tex-math></inline-formula> V, the maximum current variation was observed when the single dopant is placed in the middle of the channel length and the middle of fin height and width. For this case, the variation is 19.47% with respect to the nominal current. For <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}} = {0.5}$ </tex-math></inline-formula> V and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}} = {0.7}$ </tex-math></inline-formula> V, the maximum current variation was observed when the dopant is closer to the source region, and the current variation is, respectively, 20.60% and 21.48%.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2024-09-16
DOI
https://doi.org/10.1109/ted.2024.3440276
Citations
2
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
Type
article
Field-Weighted Citation Impact
0.42

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article

Study of the Impact of RDF on n-Type SOI Nanowire FET via Quantum-Corrected Monte Carlo Device Simulations

Gilson Wirth, Gabriela Firpo Furtado, Alan C. J. Rossetto, Dragica Vasileska et al.
2 citations
IEEE Transactions on Electron Devices
Advancements in Semiconductor Devices and Circuit Design
0.42
article

Study of the Impact of RDF on n-Type SOI Nanowire FET via Quantum-Corrected Monte Carlo Device Simulations

Gilson Wirth, Gabriela Firpo Furtado, Alan C. J. Rossetto, Dragica Vasileska, Caroline S. Soares, Marcelo Antonio Pavanello
article en
2 citations

Abstract

This article investigates the impact of random dopant fluctuation (RDF) on the current of a n-type nanowire silicon on insulator (SOI) triple-gate transistor. This study was performed employing a quantum-corrected Monte Carlo (MC) device simulator that was successfully assessed by comparing the simulation characteristics curves with experimental data. The results demonstrate that the impact of a single dopant atom on the transistor’s current depends on the dopant position along the channel length, fin height, and width. A random dopant in the channel affects the electrostatics, the electron density, and the electron mobility, thus degrading the transistor current. The study was performed for <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {GS}} = {0.5}$ </tex-math></inline-formula> V, and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}} = {0.2}$ </tex-math></inline-formula> V, <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}} = {0.5}$ </tex-math></inline-formula> V, and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}} = {0.7}$ </tex-math></inline-formula> V. For <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}} = {0.2}$ </tex-math></inline-formula> V, the maximum current variation was observed when the single dopant is placed in the middle of the channel length and the middle of fin height and width. For this case, the variation is 19.47% with respect to the nominal current. For <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}} = {0.5}$ </tex-math></inline-formula> V and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}} = {0.7}$ </tex-math></inline-formula> V, the maximum current variation was observed when the dopant is closer to the source region, and the current variation is, respectively, 20.60% and 21.48%.

IEEE Transactions on Electron DevicesVol. 71(10)
Universidade Federal do Rio Grande do Sul (BR), Centro Universitário FEI (BR), Universidade Federal de Pelotas (BR), Brazilian Computer Society (BR), Arizona State University (US)
Coordenação de Aperfeiçoamento de Pessoal de Nível Superior, Conselho Nacional de Desenvolvimento Científico e Tecnológico
Openalex Percentile: Top 38%
Advancements in Semiconductor Devices and Circuit Design
0.42
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