Self-Limited Thinning Approach for Strictly Monolayer 2D Materials

High-quality monolayer two-dimensional (2D) transition metal dichalcogenides (TMDCs) are promising materials for continued scaling of optoelectronics even beyond the diffraction limit. Here we demonstrate a manufacturing-viable growth technology for the preparation of wafer-scale monolayer TMDCs.

Authors

Shi Wun Tong (ORCID: https://orcid.org/0000-0003-3584-1873)
Dongzhi Chi (ORCID: https://orcid.org/0000-0001-9562-1595)

Institutions

Agency for Science, Technology and Research (SG)
Institute of Materials Research and Engineering (SG)

Publication Details

Published: 2024-08-04
DOI: https://doi.org/10.1109/cleo-pr60912.2024.10676429
Primary Topic: Graphene research and applications
Type: article
Field-Weighted Citation Impact: 0.00

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article

Self-Limited Thinning Approach for Strictly Monolayer 2D Materials

Shi Wun Tong, Dongzhi Chi

Aug 4, 2024

Graphene research and applications

article

Self-Limited Thinning Approach for Strictly Monolayer 2D Materials

Shi Wun Tong, Dongzhi Chi

August 4, 2024article en

Abstract

Vol. 12

Agency for Science, Technology and Research (SG), Institute of Materials Research and Engineering (SG)

Climate action

Openalex Percentile: Top 90%

Graphene research and applications

DOI Source OpenAlex

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Self-Limited Thinning Approach for Strictly Monolayer 2D Materials — Shi Wun Tong, Dongzhi Chi · (2024) | TGRS Research Map | TGRS