Ultralow-Loss Silicon Nitride Microresonators Using Room-Temperature Sputtering
Ultralow-loss silicon nitride on insulator films with high thickness are demonstrated with room temperature reactive sputtering. Microring resonators fabricated with said films reach optical Q-factors above 10 million after 800 °C thermal annealing. © 2024 The Author(s)
Authors
- Shuangyou Zhang (ORCID: https://orcid.org/0009-0005-4785-9626)
- Yaojing Zhang (ORCID: https://orcid.org/0000-0002-2663-0188)
- Pascal Del’Haye (ORCID: https://orcid.org/0000-0002-6517-6942)
- Florentina Gannott
- Alexander Gumann
- Eduard Butzen
- Irina Harder
- Toby Bi (ORCID: https://orcid.org/0000-0001-5670-6115)
- Olga Ohletz
Institutions
- Max Planck Institute for the Science of Light (DE)
Publication Details
- Published
- 2024-08-04
- DOI
- https://doi.org/10.1109/cleo-pr60912.2024.10676445
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00