Nanoscale Phase Change of Cr2Ge2Te6 Thin Films Induced by Terahertz Near-Fields

To elucidate nanoscale properties of memory operation in phase-change material Cr2Ge2Te6, we employed the terahertz (THz) scanning tunnelling microscope and investigated the nanoscale phase change. Nanoscale phase-change structures are successfully created by the THz irradiation. © 2024 The Author(s).

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Publication Details

Published
2024-08-04
DOI
https://doi.org/10.1109/cleo-pr60912.2024.10676684
Primary Topic
Chalcogenide Semiconductor Thin Films
Type
article
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article

Nanoscale Phase Change of Cr2Ge2Te6 Thin Films Induced by Terahertz Near-Fields

Yinli Wang, Yi Shuang, Ikufumi Katayama, Jun Takeda et al.
Chalcogenide Semiconductor Thin Films
article

Nanoscale Phase Change of Cr2Ge2Te6 Thin Films Induced by Terahertz Near-Fields

Yinli Wang, Yi Shuang, Ikufumi Katayama, Jun Takeda, Satoshi Kusaba, Yuji Sutou, Dang-il Kim, Ryo Tamaki, Mizuki Kawaji
article en

Abstract

To elucidate nanoscale properties of memory operation in phase-change material Cr2Ge2Te6, we employed the terahertz (THz) scanning tunnelling microscope and investigated the nanoscale phase change. Nanoscale phase-change structures are successfully created by the THz irradiation. © 2024 The Author(s).

Yokohama National University (JP), Tohoku University (JP), Advanced Institute of Materials Science (JP)
Openalex Percentile: Top 87%
Chalcogenide Semiconductor Thin Films
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