Fast ${\text{MoS}_{2}}$ Photodetector with Ultralow Contact Resistance

We demonstrate a fast MoS2 photodetector with ultralow contact resistance (<1000 Ω) by using bismuth electrodes. The device exhibits a rise time of 10.5 μs, which is one of the highest among similar devices.

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Publication Details

Published
2024-08-04
DOI
https://doi.org/10.1109/cleo-pr60912.2024.10676788
Primary Topic
2D Materials and Applications
Type
article
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article

Fast ${\text{MoS}_{2}}$ Photodetector with Ultralow Contact Resistance

Fengqiu Wang, Anran Wang, Chen Hu, Wangheng Pan
2D Materials and Applications
article

Fast ${\text{MoS}_{2}}$ Photodetector with Ultralow Contact Resistance

Fengqiu Wang, Anran Wang, Chen Hu, Wangheng Pan
article en

Abstract

We demonstrate a fast MoS2 photodetector with ultralow contact resistance (<1000 Ω) by using bismuth electrodes. The device exhibits a rise time of 10.5 μs, which is one of the highest among similar devices.

Vol. 340
Nanjing University (CN)
Openalex Percentile: Top 90%
2D Materials and Applications
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Fast ${\text{MoS}_{2}}$ Photodetector with Ultralow Contact Resistance — Fengqiu Wang, Anran Wang, et al. · (2024) | TGRS Research Map | TGRS