An EUV Mask Microscopy System with Two Zone Plate Design
This study introduces a simplified EUV mask microscopy system. Utilizing a dual zone plate design, it achieves sub-55nm mask pattern detection. The system is nearing deployment after setup at the Shanghai Synchrotron Radiation Facility BL09B.
Authors
- Kunyang Li (ORCID: https://orcid.org/0000-0002-0867-8946)
- Zhenjiang Xing
- Zhou Zhou (ORCID: https://orcid.org/0000-0002-6490-8945)
- Jinjiang Fu
- Junyao Luo
- Shuying Deng (ORCID: https://orcid.org/0000-0003-2795-5360)
Institutions
- Sun Yat-sen University (CN)
- Institute of Advanced Light Source Facilities Shenzhen (CN)
Publication Details
- Published
- 2024-08-04
- DOI
- https://doi.org/10.1109/cleo-pr60912.2024.10676442
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Natural Science Foundation of China
- National Key Research and Development Program of China
- Basic and Applied Basic Research Foundation of Guangdong Province