A Fully Automatic High-Resolution EUV Monochromator for EUV metrology applications

We develop a fully automatic EUV monochromator, and demonstrate real-time wavelength tuning and in-situ and in-line spectrum measurement. This is an ideal tool for EUV metrology applications.

Authors

R.L. Meng (ORCID: https://orcid.org/0000-0001-6362-0707)
Xiaoshi Zhang (ORCID: https://orcid.org/0000-0002-5281-6285)
Jianhui Chen (ORCID: https://orcid.org/0000-0001-6501-9819)
Junfeng Cui
Bianli Zhao
Hao Yang (ORCID: https://orcid.org/0009-0007-7437-1815)

Institutions

Yunnan University (CN)

Publication Details

Published: 2024-08-04
DOI: https://doi.org/10.1109/cleo-pr60912.2024.10676889
Citations: 1
Primary Topic: Advancements in Photolithography Techniques
Type: article
Field-Weighted Citation Impact: 0.21

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article

A Fully Automatic High-Resolution EUV Monochromator for EUV metrology applications

R.L. Meng, Xiaoshi Zhang, Jianhui Chen, Junfeng Cui et al.

Aug 4, 2024

1 citations

Advancements in Photolithography Techniques

0.21

article

A Fully Automatic High-Resolution EUV Monochromator for EUV metrology applications

R.L. Meng, Xiaoshi Zhang, Jianhui Chen, Junfeng Cui, Bianli Zhao, Hao Yang

August 4, 2024article en

1 citations

Abstract

We develop a fully automatic EUV monochromator, and demonstrate real-time wavelength tuning and in-situ and in-line spectrum measurement. This is an ideal tool for EUV metrology applications.

Yunnan University (CN)

Openalex Percentile: Top 48%

Advancements in Photolithography Techniques

0.21

DOI Source OpenAlex

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A Fully Automatic High-Resolution EUV Monochromator for EUV metrology applications — R.L. Meng, Xiaoshi Zhang, et al. · (2024) | TGRS Research Map | TGRS