A numerical analysis of the short open load calibration robustness for capacitance measurements in Scanning Microwave Microscopy

Abstract As the dimensions of nanoelectronics components are increasingly reduced, the need for reliable nanoscale characterization of electrical properties has become critical. In particular, the measurement of sub-femtofarad capacitance is a key element in developing thin films, unlocking the possibility of extracting the local permittivity and loss tangent. 
These quantities can be determined by measuring local impedance (ZS) measured by a Scanning Microwave Microscope (SMM). By coupling an Atomic Force Microscope (AFM) to a Vector Network Analyzer (VNA), the SMM measures the reflection coefficient (S11) of a microwave focused locally on the sample’s surface. The relationship between S11 and ZS is given by S11 = (ZS – Z0)/(ZS + Z0), where Z0 is a reference impedance (Z0 = 50 Ω), and ZS is the impedance located in the reference plane of S11. Nevertheless, the instrument must be calibrated to bring the reference plane from the VNA ports to the tip-sample interface for the impedance measurement of the sample. Previous papers have shown an uncertainty associated with this calibration as low as 3%. Numerous experimental parameters affect the accuracy of impedance measurements in scanning microwave microscopy (SMM). Investigating their individual effects on the measured values is particularly challenging. 
Here, we present the development of a fully numerical FEM-based environment as a digital twin to the actual SMM measurements. We demonstrate the application of a self-calibration procedure for the simulated SMM measurements with a maximal deviation of ± 0.8 % relative to reference capacitances determined via an electrostatic finite element model. Furthermore, we demonstrate the possibility of assessing water meniscus-induced effects on the simulated SMM measurements. Typically, water meniscus impacts the calibration by a 0.4% relative deviation, in accordance with previously reported empiric data. Our findings are expected to promote access to a deeper understanding of nanoscale capacitance measurements in scanning microwave microscopy. 

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Journal
Measurement Science and Technology
Published
2024-09-23
DOI
https://doi.org/10.1088/1361-6501/ad7e3b
Primary Topic
Near-Field Optical Microscopy
Type
article
Field-Weighted Citation Impact
0.00

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article

A numerical analysis of the short open load calibration robustness for capacitance measurements in Scanning Microwave Microscopy

Damien Richert, Khaled Kaja, Damien Deleruyelle, Almazbek Imanaliev et al.
Measurement Science and Technology
Near-Field Optical Microscopy
article

A numerical analysis of the short open load calibration robustness for capacitance measurements in Scanning Microwave Microscopy

Damien Richert, Khaled Kaja, Damien Deleruyelle, Almazbek Imanaliev, Brice Gautier, François Piquemal, José Morán‐Meza, Johannes Hoffmann
article en

Abstract

Abstract As the dimensions of nanoelectronics components are increasingly reduced, the need for reliable nanoscale characterization of electrical properties has become critical. In particular, the measurement of sub-femtofarad capacitance is a key element in developing thin films, unlocking the possibility of extracting the local permittivity and loss tangent. 
These quantities can be determined by measuring local impedance (ZS) measured by a Scanning Microwave Microscope (SMM). By coupling an Atomic Force Microscope (AFM) to a Vector Network Analyzer (VNA), the SMM measures the reflection coefficient (S11) of a microwave focused locally on the sample’s surface. The relationship between S11 and ZS is given by S11 = (ZS – Z0)/(ZS + Z0), where Z0 is a reference impedance (Z0 = 50 Ω), and ZS is the impedance located in the reference plane of S11. Nevertheless, the instrument must be calibrated to bring the reference plane from the VNA ports to the tip-sample interface for the impedance measurement of the sample. Previous papers have shown an uncertainty associated with this calibration as low as 3%. Numerous experimental parameters affect the accuracy of impedance measurements in scanning microwave microscopy (SMM). Investigating their individual effects on the measured values is particularly challenging. 
Here, we present the development of a fully numerical FEM-based environment as a digital twin to the actual SMM measurements. We demonstrate the application of a self-calibration procedure for the simulated SMM measurements with a maximal deviation of ± 0.8 % relative to reference capacitances determined via an electrostatic finite element model. Furthermore, we demonstrate the possibility of assessing water meniscus-induced effects on the simulated SMM measurements. Typically, water meniscus impacts the calibration by a 0.4% relative deviation, in accordance with previously reported empiric data. Our findings are expected to promote access to a deeper understanding of nanoscale capacitance measurements in scanning microwave microscopy. 

Measurement Science and Technology
Institut des Nanotechnologies de Lyon (FR), Swiss Federal Institute of Metrology (CH), Laboratoire National de Métrologie et d'Essais (FR), Systèmes de Référence Temps-Espace (FR)
European Metrology Programme for Innovation and Research
Openalex Percentile: Top 86%
Near-Field Optical Microscopy
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