Relationship Between Growth Surface Temperature and Crystal Structure of TiO₂ Coatings Prepared Using Direct Current Pulsed Magnetron Sputtering Technology

In this study, TiO 2 coatings are deposited on Si(100) wafers by direct current pulsed magnetron sputtering technology. The crystal structure of TiO 2 coatings gradually transforms from the anatase phase to the amorphous phase when the sputtering power is decreased from 900[Formula: see text]W to 150[Formula: see text]W. Besides, the growth surface temperature of TiO 2 coatings decreases from 630°C to 241°C. The relationship between the growth behavior and growth surface temperature of TiO 2 coatings is investigated using the dynamic scaling theory. The results show that in the first stage, the growth behavior of TiO 2 coatings gradually transforms from the Frank–van der Merwe mode to the Volmer–Weber mode with decreasing sputtering power from 900[Formula: see text]W to 150[Formula: see text]W. In the second stage, the growth behavior of TiO 2 coatings gradually transforms from the Stranski–Krastanov mode to the Volmer–Weber mode. Transformation of the growth behavior of TiO 2 coatings in the second stage transforms the crystal structure of TiO 2 coatings from the anatase phase to the amorphous phase.