Three-dimensional multi-parametric surface detection technology based on atomic force microscopy

<p indent="0mm">Three-dimensional (3D) micro-nano electronic devices are gradually becoming the mainstream semiconductor component, due to their excellent compact structure and high functional density. 3D multi-parametric surface detection with quantitative analysis is especially critical to the functional quality control of these 3D micro-nano devices. As a practical detection instrument, atomic force microscopy (AFM) can realize high-resolution imaging of micro-nano surface morphology, electrical and mechanical properties through tip‒sample interaction force feedback. This review summarizes the 3D multi-parametric surface detection technology based on AFM. Firstly, the AFM measurement principles of surface topography, surface potential, and surface nanomechanical properties are introduced. And then, AFM-based 3D surface topography measurement methods are demonstrated, the advantages and limitations of which are discussed simultaneously. In addition, current 3D surface potential and 3D surface nanomechanical properties mapping methods are described. The necessity of 3D surface electrical and mechanical properties detection, and the limitations of current 3D surface detection methods are analyzed. Finally, the development and challenges of 3D multi-parametric surface detection technology based on AFM in the future are prospected and briefly reported, respectively. The AFM-based 3D multi-parametric surface detection technology outlined in this paper will provide powerful technical support for promoting the functional mechanism research of 3D micro-nano electronic devices.