High-throughput exploration of the Na2O-ZrO2-SiO2-P2O5 composition space using thin film material libraries

Abstract The composition space Na 2 O-ZrO 2 -SiO 2 -P 2 O 5 was explored using thin film material libraries and high-throughput characterization methods. The combinatorial synthesis comprised non-reactive magnetron co-sputtering at room temperature from two elemental targets Zr and Si, and a compound Na 3 PO 4 target followed by a two-step annealing process. The NASICON phase formed for all compositions on the material library produced at the optimized deposition parameters, also displaying a phase-pure Na 1+x Zr 2 Si x P 3−x O 12 ( x = 0.4—2.9) region. Analytical TEM analysis of the NASICON phase at a measurement area with stoichiometric composition revealed a fine-grained microstructure and homogeneous Si distribution, in contrast to Na-P excess conditions, where large Si-free NASICON grains have formed.