Influence of the edge effect of the solenoid magnetic field on the discharge process of magnetron sputtering in long and narrow chambers

Abstract The fourth-generation light source or future particle accelerators have compact vacuum systems, resulting in a small flow conductance of the beam chamber. The development of NEG (Non-Evaporable Getters) films technology with distributed pumping is a good solution. This technology can obtain a pressure distribution with a small pressure gradient and an ultra-high vacuum of 10 -8 Pa inside the vacuum chambers. In the magnetron sputtering process for NEG coating, the inhomogeneity of the magnetic field at the edge of the solenoid is a key parameter for affecting the stability of the magnetron sputtering discharge process. The influence mechanism of the edge magnetic field on the plasma discharge process and discharge uniformity was studied to optimize the coating parameters, which is very important. The Particle-In-Cell/Monte Carlo Collision (PIC/MCC) method was employed to simulate plasma discharge in a narrow vacuum chamber under various edge magnetic field conditions. The potential distribution, charged particle density distribution, and particle density distribution on the target were acquired for four sets of discharge parameters, followed by data processing and analysis. The electric field distribution during the discharge process is closely linked to the non-uniformity of the magnetic field at the solenoid's edge. The smaller Br (the radial component of the magnetic field) component of the magnetic field, the more uniform distribution of Ar + on the target surface, and the smaller the difference along the length of the vacuum chamber. A smaller radial component (Br) of the magnetic field results in a more uniform distribution of Ar + on the target surface and reduces variations in film thickness along the length of the vacuum chamber. This is attributed to the small distance between the inner wall of the vacuum chamber and the cathode target. The change in the edge magnetic field will result in the rapid migration of electrons to the inner wall of the vacuum chamber and insufficient collision with the discharge gas, making it challenging to sustain the discharge process. Moreover, fluctuations in the edge magnetic field of the solenoid induce gradient drift and curvature drift in charged particles, resulting in rapid electron loss and alterations in the density and potential distribution of charged particles at the ends of the vacuum chamber, ultimately leading to discharge instability. The research results show the importance of the edge magnetic field effect on the magnetron sputtering coating of the slender vacuum chambers, which provides an important reference for the segmented coating process of similar vacuum chambers in future accelerators.