Study on Preparation of CrSi Thin Film Resistance by Magnetron Sputtering

Thin films prepared by magnetron sputtering can overcome the shortcomings of electron beam evaporation and have the advantages of film thickness control, adhesion, density, conductivity and refractive index, etc. This paper uses the method of literature research and review to clarify the specific process influencing factors in the preparation of CrSi films by magnetron sputtering and subsequent annealing. It provides a reference basis for the integrated application of CrSi thin film resistors.