<i>Ab Initio</i> Kinetic Pathway of Diborane Decomposition on Transition Metal Surfaces in Borophene Chemical Vapor Deposition Growth

The chemical vapor deposition (CVD) method holds promise for the scalable and controlled synthesis of high-quality borophene. However, the current lack of an atomistic understanding of intricate kinetic pathways from precursors to borophene impedes process optimization. Here, we employ first-principles simulations to systematically explore the pyrolytic decomposition pathways of the most used precursor diborane (B<sub>2</sub>H<sub>6</sub>) to borophene on various transition metal surfaces. Our results reveal that B<sub>2</sub>H<sub>6</sub> on various metal substrates exhibits different dissociation behaviors. Meanwhile, the activity of the examined metal substrates is quite anisotropic and surface direction-dependent, where the estimated overall catalytic activity order of these metals is found to be Pd ≈ Pt ≈ Rh > Ir ≈ Ru ≈ Cu > Au ≈ Ag. Our study provides atomistic insights into the dissociation kinetics of diborane precursors on various transition metal surfaces, serving as a guide for experimental growth of borophene.

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Publication Details

Journal
The Journal of Physical Chemistry Letters
Published
2024-09-16
DOI
https://doi.org/10.1021/acs.jpclett.4c01770
Citations
4
Primary Topic
Boron and Carbon Nanomaterials Research
Type
article
Field-Weighted Citation Impact
0.47

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article

Ab Initio Kinetic Pathway of Diborane Decomposition on Transition Metal Surfaces in Borophene Chemical Vapor Deposition Growth

Yu Xie, Hanyu Liu, Linlin Liu, Keith T. Butler et al.
4 citations
The Journal of Physical Chemistry Letters
Boron and Carbon Nanomaterials Research
0.47
article

Ab Initio Kinetic Pathway of Diborane Decomposition on Transition Metal Surfaces in Borophene Chemical Vapor Deposition Growth

Yu Xie, Hanyu Liu, Linlin Liu, Keith T. Butler, Congwei Xie, Zhuhua Zhang, Xianqi Song, Quan Li, Dan Sun, Chennan Song
article en
4 citations

Abstract

The chemical vapor deposition (CVD) method holds promise for the scalable and controlled synthesis of high-quality borophene. However, the current lack of an atomistic understanding of intricate kinetic pathways from precursors to borophene impedes process optimization. Here, we employ first-principles simulations to systematically explore the pyrolytic decomposition pathways of the most used precursor diborane (B<sub>2</sub>H<sub>6</sub>) to borophene on various transition metal surfaces. Our results reveal that B<sub>2</sub>H<sub>6</sub> on various metal substrates exhibits different dissociation behaviors. Meanwhile, the activity of the examined metal substrates is quite anisotropic and surface direction-dependent, where the estimated overall catalytic activity order of these metals is found to be Pd ≈ Pt ≈ Rh > Ir ≈ Ru ≈ Cu > Au ≈ Ag. Our study provides atomistic insights into the dissociation kinetics of diborane precursors on various transition metal surfaces, serving as a guide for experimental growth of borophene.

The Journal of Physical Chemistry LettersVol. 15(38)
Jilin University (CN), Chinese Academy of Sciences (CN), Xinjiang Technical Institute of Physics & Chemistry (CN), Jilin International Studies University (CN), State Key Laboratory of High Pressure and Superhard Materials (CN), University College London (GB), Nanjing University of Aeronautics and Astronautics (CN)
National Natural Science Foundation of China, Fundamental Research Funds for the Central Universities, Program for Jilin University Science and Technology Innovative Research Team
Openalex Percentile: Top 39%
Boron and Carbon Nanomaterials Research
0.47
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