Interplay of acoustophoresis and dielectrophoresis in a standing surface acoustic wave field: from spherical to non-spherical particles

Abstract Standing surface acoustic waves (sSAW) emerged as a flexible tool for precise manipulation of spherical and non-spherical objects in Lab-on-a-Chip devices. While the manipulation of suspended particles and cells in acoustofluidic devices is mostly dominated by acoustic forces due to acoustic scattering and the acoustically induced fluid flow, surface acoustic waves are inherently linked to an inhomogeneous electric field. The superimposed effects of dielectrophoretic forces and torques on polarizable particles are less explored in microfluidics using sSAW. In this study, a thorough analysis of the physical interplay of acoustophoresis and dielectrophoresis aims to bridge this gap. In comprehensive experiments, the dielectrophoretic impact on the behavior of spherical and non-spherical particles is distinguished by screening the electric field of the sSAW inside the micro channel locally. As a result, particles are forced into trapping locations across the entire channel height. However, the height position close to the bottom differs between the screened and non-screened region. Regardless of the shape of the particles used in this study, particles are forced towards the bottom at the region with screening, while being levitated at regions without screening. This indicates clearly the influence of the electric field in close vicinity to the substrate surface. Furthermore, the unintuitive preferred orientation of prolate spheroids perpendicular to the pressure nodes of the sSAW recently reported, is confirmed in both region regardless of the presence of the electric field. Based on a three-dimensional numerical model, this orientation results not only due to the acoustic torque but is also caused by the dielectrophoretic torque, which complement each other. The experimental and numerical findings are in excellent agreement and provide deep insights into the underlying physical mechanisms responsible for patterning and orientation of the particles.