Technostress or reaction to techno-stressors? Validation of bilingual techno-stressors index (TSI-II) and a second-order formative model of techno-distress among Canadian legal professionals

Technostress is a phenomenon that needs to be seen as a process rather than a result. This requires the adaptation of measurement tools accordingly. Legal professionals are particularly exposed to technostress. This paper presents the validation of the TSI-II, an updated and bilingual version of the Techno-Stressors Index (TSI). This updated instrument was tested (French-n = 35; English-n = 30) and then retested (Overall-n = 4482; FR-n 1 = 544; ENG-n 2 = 3938) in both languages among Canadian legal professionals. Using the TSI-II, this paper proposes a second-order formative model of techno-distress, including seven techno-stressors, which captures the recent developments associated with the evolution of the technostress literature. Following the best practices for scale development, TSI-II presents excellent properties and is a good predictor of perceived stress among legal professionals. This validation aligns with developments in technostress literature, namely, the conceptual evolution of techno-distress as a component of the technostress process. • TSI-II proposes a second-order formative construct for measuring techno-distress including seven techno-stressors. • The validation process is aligned with the formative evolution of technostress. • The final bilingual instrument was validated in English and in French among Canadian legal professionals. • TSI-II presents excellent properties and is a good predictor of perceived stress among professionals.

Authors

Institutions

Publication Details

Journal
Computers in Human Behavior Reports
Published
2024-09-10
DOI
https://doi.org/10.1016/j.chbr.2024.100485
Citations
3
Primary Topic
Technostress in Professional Settings
Type
article
Field-Weighted Citation Impact
1.93

Funders

Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Technostress or reaction to techno-stressors? Validation of bilingual techno-stressors index (TSI-II) and a second-order formative model of techno-distress among Canadian legal professionals

Marie-Michelle Gouin, Nathalie Cadieux, Pierre‐Luc Fournier, A Camille et al.
3 citations
Computers in Human Behavior Reports
Technostress in Professional Settings
1.93
article

Technostress or reaction to techno-stressors? Validation of bilingual techno-stressors index (TSI-II) and a second-order formative model of techno-distress among Canadian legal professionals

Marie-Michelle Gouin, Nathalie Cadieux, Pierre‐Luc Fournier, A Camille, Jean Cadieux, Éveline Morin
article en
3 citations

Abstract

Technostress is a phenomenon that needs to be seen as a process rather than a result. This requires the adaptation of measurement tools accordingly. Legal professionals are particularly exposed to technostress. This paper presents the validation of the TSI-II, an updated and bilingual version of the Techno-Stressors Index (TSI). This updated instrument was tested (French-n = 35; English-n = 30) and then retested (Overall-n = 4482; FR-n 1 = 544; ENG-n 2 = 3938) in both languages among Canadian legal professionals. Using the TSI-II, this paper proposes a second-order formative model of techno-distress, including seven techno-stressors, which captures the recent developments associated with the evolution of the technostress literature. Following the best practices for scale development, TSI-II presents excellent properties and is a good predictor of perceived stress among legal professionals. This validation aligns with developments in technostress literature, namely, the conceptual evolution of techno-distress as a component of the technostress process. • TSI-II proposes a second-order formative construct for measuring techno-distress including seven techno-stressors. • The validation process is aligned with the formative evolution of technostress. • The final bilingual instrument was validated in English and in French among Canadian legal professionals. • TSI-II presents excellent properties and is a good predictor of perceived stress among professionals.

Computers in Human Behavior ReportsVol. 16
Université de Sherbrooke (CA)
Canadian Bar Association, Social Sciences and Humanities Research Council of Canada
Openalex Percentile: Top 14%
Technostress in Professional Settings
1.93
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.