Fabrication of Ripple Structured Silicon Carbide (SiC) Films for Nano‐Grating and Solar Cell Applications

Abstract In the present study, we aim to investigate the self‐organization of unexplored silicon carbide (SiC) film surfaces under 30 keV oblique Ar + ions irradiation and hence unprecedented tailoring of optical and electrical characteristics with view of their uses in solar cells, gratings and nano‐ to micro‐scale devices. The surface morphology mainly consisted of triangular shaped nanoparticles which evolves into nanoscale ripple structures with an alignment parallel to the projection of ion beam direction. For the first time, we have demonstrated the fabrication of highly‐ordered ripple patterns with wavelength in visible region over SiC films and applicable as nano‐gratings. The underlying mechanism relies on the structural rearrangement due to transition of film microstructure from amorphous to mixed phase (crystalline, nano‐crystalline and amorphous) and lowering of C=C and C−C vibration modes by the heavier Si atoms. These nanostructured silicon carbide film shows unparalleled optical (energy gap decreases from 4.60±0.4 eV to 3.16±0.2 eV) & electrical characteristics (conductivity increases from 6.6×10 −11 to 1.12×10 −3 S/m with linear I−V behavior). Thus, we propose that ripple structured SiC films with wide band gap, high refractive index and high electrical conductivity with ohmic behaviour are promising candidates for application as window layer in solar cells and opto‐electronics.