Infrared optical properties of SiGeSn and GeSn layers grown by molecular beam epitaxy

The infrared optical properties of thick GeSn films (>500 nm) having 10% Sn concentration and of SiGeSn layers, utilized for the growth of strain-relieved, direct-gap GeSn films by molecular beam epitaxy, are investigated. Two growth methods are used: a graded-growth structure and a stepped-growth structure that help us to illustrate the properties of the GeSn and SiGeSn layers. Interestingly, there can be strong absorption in SiGeSn films throughout the infrared. We observe an increase in infrared absorption with increasing Sn concentration up to 21% Sn and in films, where the Sn is held constant at 18%, with increasing Si concentration up to 30%. Cavity effects in the infrared transmission measurement of stepped-growth structures are observed and associated with reflections at growth interfaces. Si–Si bond formation is proposed to occur at high Si concentrations in SiGeSn films, and the bandgap in SiGeSn films appears to decrease with increasing Si and Sn concentrations.