Examining the adoption of technology-enhanced learning in universities and its effects on student performance, satisfaction, and motivation

The integration of technology in Higher Education has witnessed substantial growth in recent years. While extensive research has explored the collective educational implications of Technology-Enhanced Learning (TEL) at universities, there remains an incomplete understanding of its effects on individual students when viewed through the lens of Person-Environment misfit theory and technostress. This paper aims to fill this gap by examining the impact of student and university misfit when adopting TEL and technostress on students' performance, satisfaction, and motivation. Utilizing a quantitative survey, we gathered data from a sample of 332 Higher Education students in the UK. The results reveal the significant influence of student and university misfit in adopting TEL on academic performance, satisfaction, and motivation. Moreover, the findings highlight the mediating role of technostress in these intricate relationships. Our research indicates that technostress stems not from the use of technology itself but from the misfit between students and the university learning environment. To address this, universities should enhance students' sense of belonging by offering additional pastoral and academic support. Moreover, providing training to boost students' digital confidence and skills is crucial. Creating a psychologically healthy technology-enhanced learning environment will ensure a more pleasant learning experience, alleviating student technostress.

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Publication Details

Journal
Computers and Education Open
Published
2024-09-10
DOI
https://doi.org/10.1016/j.caeo.2024.100223
Citations
10
Primary Topic
Technostress in Professional Settings
Type
article
Field-Weighted Citation Impact
6.44
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article

Examining the adoption of technology-enhanced learning in universities and its effects on student performance, satisfaction, and motivation

Ruwan Abeysekera, Helen O’Sullivan, Shujie Chen, Dr Jeff Bray et al.
10 citations
Computers and Education Open
Technostress in Professional Settings
6.44
article

Examining the adoption of technology-enhanced learning in universities and its effects on student performance, satisfaction, and motivation

Ruwan Abeysekera, Helen O’Sullivan, Shujie Chen, Dr Jeff Bray, Izzy Keevill-Savage, Yan Liang
article en
10 citations

Abstract

The integration of technology in Higher Education has witnessed substantial growth in recent years. While extensive research has explored the collective educational implications of Technology-Enhanced Learning (TEL) at universities, there remains an incomplete understanding of its effects on individual students when viewed through the lens of Person-Environment misfit theory and technostress. This paper aims to fill this gap by examining the impact of student and university misfit when adopting TEL and technostress on students' performance, satisfaction, and motivation. Utilizing a quantitative survey, we gathered data from a sample of 332 Higher Education students in the UK. The results reveal the significant influence of student and university misfit in adopting TEL on academic performance, satisfaction, and motivation. Moreover, the findings highlight the mediating role of technostress in these intricate relationships. Our research indicates that technostress stems not from the use of technology itself but from the misfit between students and the university learning environment. To address this, universities should enhance students' sense of belonging by offering additional pastoral and academic support. Moreover, providing training to boost students' digital confidence and skills is crucial. Creating a psychologically healthy technology-enhanced learning environment will ensure a more pleasant learning experience, alleviating student technostress.

Computers and Education OpenVol. 7
University of Kelaniya (LK), Capital University of Economics and Business (CN), Bournemouth University (GB)
Quality Education
Openalex Percentile: Top 3%
Technostress in Professional Settings
6.44
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