Ultra-Low Dark Count Rate SPAD Fully Integrated in a 180 nm High-Voltage CMOS Process

A novel structure of a single-photon avalanche diode (SPAD) fabricated in a commercial <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {180}$ </tex-math></inline-formula> nm high-voltage (HV) complementary metal-oxide-semiconductor (CMOS) process is presented. Device performance in terms of dark count rate (DCR) and photon detection probability (PDP) is compared to a previously published design fabricated as a reference on the same die. We find that the new structure exhibits a DCR of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {0.11}$ </tex-math></inline-formula> Hz/<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {\mu }$ </tex-math></inline-formula>m<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {^{2}}$ </tex-math></inline-formula> at an excess voltage of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {5}$ </tex-math></inline-formula> V, which is among the lowest ever reported in a foundry CMOS process, and more than <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {3}$ </tex-math></inline-formula> times lower with respect to the reference device. Moreover, the new structure shows a PDP/DCR ratio higher by up to a factor of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {4.2}$ </tex-math></inline-formula> compared to the reference device. The reasons underlying the differences in DCR and PDP between the two structures are explained using technology computer-aided design (TCAD) simulations. The novel device is demonstrated as promising for the design of low-cost SPAD array imagers, particularly in low-noise applications.

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Publication Details

Journal
IEEE Photonics Technology Letters
Published
2024-09-10
DOI
https://doi.org/10.1109/lpt.2024.3457009
Citations
2
Primary Topic
Advanced Optical Sensing Technologies
Type
article
Field-Weighted Citation Impact
1.01

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article

Ultra-Low Dark Count Rate SPAD Fully Integrated in a 180 nm High-Voltage CMOS Process

I. Berdalović, Borna Požar, Tihomir Knežević, Tomislav Suligoj
2 citations
IEEE Photonics Technology Letters
Advanced Optical Sensing Technologies
1.01
article

Ultra-Low Dark Count Rate SPAD Fully Integrated in a 180 nm High-Voltage CMOS Process

I. Berdalović, Borna Požar, Tihomir Knežević, Tomislav Suligoj
article en
2 citations

Abstract

A novel structure of a single-photon avalanche diode (SPAD) fabricated in a commercial <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {180}$ </tex-math></inline-formula> nm high-voltage (HV) complementary metal-oxide-semiconductor (CMOS) process is presented. Device performance in terms of dark count rate (DCR) and photon detection probability (PDP) is compared to a previously published design fabricated as a reference on the same die. We find that the new structure exhibits a DCR of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {0.11}$ </tex-math></inline-formula> Hz/<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {\mu }$ </tex-math></inline-formula>m<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {^{2}}$ </tex-math></inline-formula> at an excess voltage of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {5}$ </tex-math></inline-formula> V, which is among the lowest ever reported in a foundry CMOS process, and more than <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {3}$ </tex-math></inline-formula> times lower with respect to the reference device. Moreover, the new structure shows a PDP/DCR ratio higher by up to a factor of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\boldsymbol {4.2}$ </tex-math></inline-formula> compared to the reference device. The reasons underlying the differences in DCR and PDP between the two structures are explained using technology computer-aided design (TCAD) simulations. The novel device is demonstrated as promising for the design of low-cost SPAD array imagers, particularly in low-noise applications.

IEEE Photonics Technology LettersVol. 36(20)
University of Zagreb (HR)
European Science Foundation
Affordable and clean energy
Openalex Percentile: Top 20%
Advanced Optical Sensing Technologies
1.01
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