Au-free V/Al/Pt Contacts on n-Al<sub>0.85</sub>Ga<sub>0.15</sub>N:Si Surfaces of Far-UVC LEDs
The feasibility of replacing the V/Al/Ni/Au contact on n-Al 0.85 Ga 0.15 N:Si commonly used in far-UVC LEDs with a Au-free V/Al/Pt contact has been investigated. It is shown that the V and Pt layer thicknesses play an important role for achieving a low contact resistivity and a smooth contact surface at a low annealing temperature. The specific contact resistivity of V(10 nm)/Al(120 nm)/Pt(40 nm) annealed at 700 °C for 5 min is comparable with that of V(15 nm)/Al(120 nm)/Ni(20 nm)/Au(30 nm) annealed at 850 °C for 30 s. Furthermore, the root mean square roughness of the optimized V/Al/Pt contacts was 8.3 nm as compared to 30 nm for V/Al/Ni/Au.
Authors
- Jens Raß (ORCID: https://orcid.org/0000-0002-9232-0495)
- Tim Kolbe (ORCID: https://orcid.org/0000-0002-5549-5915)
- Ina Ostermay (ORCID: https://orcid.org/0009-0007-9033-482X)
- S. Einfeldt (ORCID: https://orcid.org/0000-0001-7502-7812)
- Hyun Kyong Cho (ORCID: https://orcid.org/0000-0001-5540-2582)
Publication Details
- Journal
- ECS Journal of Solid State Science and Technology
- Published
- 2024-09-02
- DOI
- https://doi.org/10.1149/2162-8777/ad78ff
- Citations
- 1
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.31