Au-free V/Al/Pt Contacts on n-Al<sub>0.85</sub>Ga<sub>0.15</sub>N:Si Surfaces of Far-UVC LEDs

The feasibility of replacing the V/Al/Ni/Au contact on n-Al 0.85 Ga 0.15 N:Si commonly used in far-UVC LEDs with a Au-free V/Al/Pt contact has been investigated. It is shown that the V and Pt layer thicknesses play an important role for achieving a low contact resistivity and a smooth contact surface at a low annealing temperature. The specific contact resistivity of V(10 nm)/Al(120 nm)/Pt(40 nm) annealed at 700 °C for 5 min is comparable with that of V(15 nm)/Al(120 nm)/Ni(20 nm)/Au(30 nm) annealed at 850 °C for 30 s. Furthermore, the root mean square roughness of the optimized V/Al/Pt contacts was 8.3 nm as compared to 30 nm for V/Al/Ni/Au.

Authors

Publication Details

Journal
ECS Journal of Solid State Science and Technology
Published
2024-09-02
DOI
https://doi.org/10.1149/2162-8777/ad78ff
Citations
1
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
0.31
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Au-free V/Al/Pt Contacts on n-Al0.85Ga0.15N:Si Surfaces of Far-UVC LEDs

Jens Raß, Tim Kolbe, Ina Ostermay, S. Einfeldt et al.
1 citations
ECS Journal of Solid State Science and Technology
GaN-based semiconductor devices and materials
0.31
article

Au-free V/Al/Pt Contacts on n-Al0.85Ga0.15N:Si Surfaces of Far-UVC LEDs

Jens Raß, Tim Kolbe, Ina Ostermay, S. Einfeldt, Hyun Kyong Cho
article en
1 citations

Abstract

The feasibility of replacing the V/Al/Ni/Au contact on n-Al 0.85 Ga 0.15 N:Si commonly used in far-UVC LEDs with a Au-free V/Al/Pt contact has been investigated. It is shown that the V and Pt layer thicknesses play an important role for achieving a low contact resistivity and a smooth contact surface at a low annealing temperature. The specific contact resistivity of V(10 nm)/Al(120 nm)/Pt(40 nm) annealed at 700 °C for 5 min is comparable with that of V(15 nm)/Al(120 nm)/Ni(20 nm)/Au(30 nm) annealed at 850 °C for 30 s. Furthermore, the root mean square roughness of the optimized V/Al/Pt contacts was 8.3 nm as compared to 30 nm for V/Al/Ni/Au.

ECS Journal of Solid State Science and TechnologyVol. 13(9)
Openalex Percentile: Top 43%
GaN-based semiconductor devices and materials
0.31
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.