Modeling of the CVD Deposition Process for Parylene-C to Predict Thin Film Growth

Poly-para-xylylene (Parylene) coatings are a versatile class of conformal coatings that have found much use in commercial, industrial, and military applications over the years.This is due to its unique combination of abilities including chemical resistivity, durability over a wide temperature ranges, a high dielectric constant, and the ability to be conformally coated onto most materials.Because of its wide range of applications, there has been much interest finding efficient and cost-effective ways to improve film uniformity throughout the years.A major step in doing this is being able to accurately predict the deposition of this material in real systems.We investigate feasibility of this by testing current models for various fluid and kinetic properties of the monomer para-xylene in a computation fluid dynamics (CFD) simulation to predict the film growth of Parylene-C.Results are then used to validate existing models, as well as investigating new models for the rate of deposition of this material.