Ultra-low loss silicon nitride becomes even cooler
Ultra-low loss silicon nitride realized using deuterated precursors and low thermal budgets well within backend-of-line CMOS processing may accelerate widespread proliferation of their use.
Authors
- Dawn T. H. Tan (ORCID: https://orcid.org/0000-0002-7111-1125)
- Xavier X. Chia (ORCID: https://orcid.org/0000-0002-0112-6110)
Institutions
- Agency for Science, Technology and Research (SG)
- Singapore University of Technology and Design (SG)
Publication Details
- Journal
- Light Science & Applications
- Published
- 2024-09-05
- DOI
- https://doi.org/10.1038/s41377-024-01576-1
- Citations
- 4
- Primary Topic
- Advanced Fiber Laser Technologies
- Type
- article
- Field-Weighted Citation Impact
- 1.35
Funders
- National Research Foundation
- Agency for Science, Technology and Research
- National Research Foundation Singapore
- Ministry of Education - Singapore
- Institute of Microelectronics