Multi-Domain Dynamics and Ultimate Scalability of CMOS-Compatible FeFETs
Recent research on CMOS-compatible FETs aims at aggressive scaling, targeting advanced performance nodes (7 nm - 14 nm), with the ultimate scalability limit posed by direct source-to-drain tunneling (DSDT). This letter investigates the impact of multi-domain dynamics in the ferroelectric gate dielectric on FeFET scalability. Coupled solutions of 2-D Poisson’s equation with the ferroelectric’s 2-D thermodynamics model (depolarizing energy + gradient energy + free energy) are the basis of a phase-field model. Varying ferroelectric and dielectric layer thicknesses can be used to engineer domain density. Minimal DSDT, maximum ON/OFF current ratio, and maximum memory window (MW) are possible when a single domain wall (domain density = 2) is located near the mid-channel. Additional domain walls increase DSDT. Furthermore, the drain electric field shifts the domain wall towards the source, increasing DSDT. Spatial gradient in polarization drastically impacts DSDT, with hard domain walls exhibiting lower DSDT due to increased polarization gradient. Our study predicts an optimal physical gate length of 12 nm (domain density = 2) with I<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\textit {ON}}$ </tex-math></inline-formula>/I<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\textit {OFF}}~\sim ~{1}\times {10} ^{{6}}$ </tex-math></inline-formula> and subthreshold slope <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\sim ~100$ </tex-math></inline-formula> mV/dec.
Authors
- Leonard F. Register (ORCID: https://orcid.org/0000-0001-5023-0953)
- Nilesh Pandey (ORCID: https://orcid.org/0000-0002-6720-779X)
- Yogesh Singh Chauhan (ORCID: https://orcid.org/0000-0002-3356-8917)
- Sanjay K. Banerjee (ORCID: https://orcid.org/0000-0002-4478-7189)
Institutions
- The University of Texas at Austin (US)
- Indian Institute of Technology Kanpur (IN)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2024-09-05
- DOI
- https://doi.org/10.1109/led.2024.3454638
- Citations
- 7
- Primary Topic
- Ferroelectric and Negative Capacitance Devices
- Type
- article
- Field-Weighted Citation Impact
- 1.46