Effects of 1 MeV electron radiation on the AlGaN/GaN high electron mobility transistors

Abstract In this study, the effects of 1 MeV electron radiation on the D-mode GaN-based high electron mobility transistors (HEMTs) were investigated after different radiation doses. The changes in electrical properties of the device were obtained, and the related physical mechanisms were analyzed. It indicated that under the radiation dose of 5 × 10 14 cm −2 , the channel current cannot be completely pinched off even if the negative gate voltage was lower than the threshold voltage, and the gate leakage current increased significantly. The emission microscopy and scanning electron microscopy were used to determine the damage location. Besides, the radiation dose was adjusted ranging from 5 × 10 12 to 1 × 10 14 cm −2 , and we noticed that the drain−source current increased and the threshold voltage presented slightly negative shift. By calculations, it suggested that the carrier density and electron mobility gradually increased. It provided a reference for the development of device radiation reinforcement technology.

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Publication Details

Journal
Journal of Semiconductors
Published
2024-09-01
DOI
https://doi.org/10.1088/1674-4926/24020020
Citations
1
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
0.31
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article

Effects of 1 MeV electron radiation on the AlGaN/GaN high electron mobility transistors

Shiwei Feng, Z.C. Feng, Kun Bai, Xiaozhuang Lu et al.
1 citations
Journal of Semiconductors
GaN-based semiconductor devices and materials
0.31
article

Effects of 1 MeV electron radiation on the AlGaN/GaN high electron mobility transistors

Shiwei Feng, Z.C. Feng, Kun Bai, Xiaozhuang Lu, Shijie Pan, Xuan Li, Yamin Zhang
article en
1 citations

Abstract

Abstract In this study, the effects of 1 MeV electron radiation on the D-mode GaN-based high electron mobility transistors (HEMTs) were investigated after different radiation doses. The changes in electrical properties of the device were obtained, and the related physical mechanisms were analyzed. It indicated that under the radiation dose of 5 × 10 14 cm −2 , the channel current cannot be completely pinched off even if the negative gate voltage was lower than the threshold voltage, and the gate leakage current increased significantly. The emission microscopy and scanning electron microscopy were used to determine the damage location. Besides, the radiation dose was adjusted ranging from 5 × 10 12 to 1 × 10 14 cm −2 , and we noticed that the drain−source current increased and the threshold voltage presented slightly negative shift. By calculations, it suggested that the carrier density and electron mobility gradually increased. It provided a reference for the development of device radiation reinforcement technology.

Journal of SemiconductorsVol. 45(9)
Chinese Academy of Sciences (CN), Beijing University of Technology (CN), Institute of Microelectronics (CN)
Openalex Percentile: Top 44%
GaN-based semiconductor devices and materials
0.31
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Effects of 1 MeV electron radiation on the AlGaN/GaN high electron mobility transistors — Shiwei Feng, Z.C. Feng, et al. · Journal of Semiconductors (2024) | TGRS Research Map | TGRS