Understanding social media stress of organizations from a fit perspective

Previous research has overlooked the relationship between self-regulation features, techno-stresses, and workplace social media (SM) usage outcomes. This study addresses this gap using the persona-environment (P-E) fit model to explain how techno-stresses from misfit impact job outcomes and are influenced by self-regulation factors. We develop a model to analyze how SM users can better self-regulate cognition and behavior to address misfits and improve outcomes. Findings indicate that job burnout and performance are influenced by two types of techno-stresses: technology-work conflict and family-work conflict. These techno-stresses are, in turn, affected by self-regulation mechanisms, specifically IT mindfulness and deficiency of self-control. This study offers both theoretical and practical implications.