Impact of c- and m- sapphire plane orientations on the structural and electrical properties of β-Ga<sub>2</sub>O<sub>3</sub> thin films grown by metal-organic chemical vapor deposition
Abstract This work presents a comprehensive investigation into the structural and electrical properties of Ga 2 O 3 thin films grown via metal-organic chemical vapor deposition on both c - and m -plane sapphire substrates. Structural characterization revealed the β -Ga 2 O 3 phase formation in both substrate orientations, with strong epitaxial <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:mrow> <mml:mo stretchy="false">(</mml:mo> <mml:mrow> <mml:mover> <mml:mn>2</mml:mn> <mml:mo stretchy="false">¯</mml:mo> </mml:mover> </mml:mrow> <mml:mn>01</mml:mn> <mml:mo stretchy="false">)</mml:mo> </mml:mrow> </mml:math> preferential growth on c -plane substrates and polycrystalline films on m -plane substrates. Results show that Ga 2 O 3 / m -sapphire exhibits the lower electrical resistivity than its counterpart grown on c -sapphire. Activation energies of acceptor levels were estimated at ~1.4 <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:mrow> <mml:mrow> <mml:mi>eV</mml:mi> </mml:mrow> </mml:mrow> </mml:math> and ~0.7 <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:mrow> <mml:mrow> <mml:mi>eV</mml:mi> </mml:mrow> </mml:mrow> </mml:math> , for Ga 2 O 3 films grown on c - and m -plane, respectively. This result shows that growing Ga 2 O 3 on m -plane sapphire is beneficial to reach a weakly compensated sample. Cathodoluminescence analysis suggests that the additional low activation energy of ~0.18 <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:mrow> <mml:mrow> <mml:mi>eV</mml:mi> </mml:mrow> </mml:mrow> </mml:math> observed in Ga 2 O 3 grown with the highest oxygen flow on m -plane sapphire can be associated to thermally-induced migration of self-trapped hole states.
Authors
- E Serquen (ORCID: https://orcid.org/0000-0003-2773-4170)
- J. A. Guerra (ORCID: https://orcid.org/0000-0002-1734-6660)
- E. Chikoidze (ORCID: https://orcid.org/0000-0002-6566-4639)
- Lima Enrique (ORCID: https://orcid.org/0000-0002-1712-7329)
- Fabiola Bravo Hualpa (ORCID: https://orcid.org/0000-0002-8501-1897)
- Corinne Sartel
- Zeyu Chi (ORCID: https://orcid.org/0000-0003-1391-527X)
- K Lizárraga (ORCID: https://orcid.org/0000-0002-2388-4297)
Institutions
- Centre National de la Recherche Scientifique (FR)
- Universidade Federal Fluminense (BR)
- Université de Versailles Saint-Quentin-en-Yvelines (FR)
- Université Paris-Saclay (FR)
- Groupe d’Étude de la Matière Condensée (FR)
- Pontificia Universidad Católica del Perú (PE)
Publication Details
- Journal
- Journal of Physics D Applied Physics
- Published
- 2024-09-03
- DOI
- https://doi.org/10.1088/1361-6463/ad76bb
- Citations
- 6
- Primary Topic
- Ga2O3 and related materials
- Type
- article
- Field-Weighted Citation Impact
- 0.71
Funders
- Agence Nationale de la Recherche
- Consejo Nacional de Ciencia, Tecnología e Innovación Tecnológica
- Fondo Nacional de Desarrollo Científico, Tecnológico y de Innovación Tecnológica
- Office of Naval Research