Full-scale evaluation of FFU configurations in an optical cleanroom injection molding for improving thermal performance and contaminant removal

Cleanrooms are critical in the semiconductor industry, particularly for optical fabrication, where even minor contamination can compromise product quality. Effective airflow and uniform airflow distribution help to prevent contaminant accumulation, mitigate temperature variations, and avoid cross-contamination, which is crucial for achieving high-quality results and compliance with industry standards. This study introduces a novel approach to optimizing Fan Filter Unit (FFU) configurations to enhance thermal performance and contaminant removal in cleanroom settings. Integrating field measurements with advanced Computational Fluid Dynamics (CFD) simulations to comprehensively evaluate four distinct FFU designs, from dispersed to centralized configurations, focused on their impact on airflow dynamics, temperature uniformity, and particle concentration. The study identifies a significant advancement in FFU configuration by demonstrating that centralized arrangements (Designs 2 and 4) substantially improve cleanroom performance. Design 4 emerged as the most effective, showcasing a marked improvement in airflow circulation, a 12% reduction in temperature variation, and a 15% decrease in particle concentration compared to conventional designs. This achievement underscores the novel contribution of this study in optimizing FFU configurations to enhance both thermal performance and contaminant control. These findings not only advance the theoretical understanding of FFU design but also provide practical insights for improving cleanroom environments. The study offers a significant step forward in developing efficient cleanroom designs, contributing valuable guidelines for achieving good environmental control in sensitive manufacturing processes.