Is the linear relationship between the slope and intercept observed in field emission S-K plots an artifact?

The performance of field emitters is usually analyzed by linear fitting of a Fowler–Nordheim plot. It has sometimes been observed that the fitted slopes and intercepts show a strong correlation, but no convincing explanation has been provided. We propose a simple model showing that this correlation is due to fluctuations in the slope and the fact that the experiments are carried out over a defined range of voltage and current. By performing a meta-analysis, we show that this explanation correctly predicts the results of other groups in this field.

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Publication Details

Journal
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
Published
2024-08-30
DOI
https://doi.org/10.1116/6.0003828
Citations
1
Primary Topic
Semiconductor materials and devices
Type
article
Field-Weighted Citation Impact
0.21

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Is the linear relationship between the slope and intercept observed in field emission S-K plots an artifact?

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Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
Semiconductor materials and devices
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article

Is the linear relationship between the slope and intercept observed in field emission S-K plots an artifact?

P. Poncharal, A. Ayari, Stephen T. Purcell, S. Perisanu, P. Vincent
article en
1 citations

Abstract

The performance of field emitters is usually analyzed by linear fitting of a Fowler–Nordheim plot. It has sometimes been observed that the fitted slopes and intercepts show a strong correlation, but no convincing explanation has been provided. We propose a simple model showing that this correlation is due to fluctuations in the slope and the fact that the experiments are carried out over a defined range of voltage and current. By performing a meta-analysis, we show that this explanation correctly predicts the results of other groups in this field.

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and PhenomenaVol. 42(5)
Université Claude Bernard Lyon 1 (FR), Centre National de la Recherche Scientifique (FR), Institut Lumière Matière (FR)
Agence Nationale de la Recherche
Openalex Percentile: Top 49%
Semiconductor materials and devices
0.21
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Is the linear relationship between the slope and intercept observed in field emission S-K plots an artifact? — P. Poncharal, A. Ayari, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2024) | TGRS Research Map | TGRS