Formation conditions of the tungsten porous thin film with pulsed laser deposition under various gas atmosphere

Abstract Pulsed laser deposition (PLD) under gas atmospheres has been used to fabricate thin films for various applications. In this study, PLD was performed under various gas atmospheres (helium, oxygen, and argon) using tungsten (W) to investigate the morphology of thin films. Various types of structures were formed, including uniform, nanoparticles, and columnar structures. In particular, the substrate fabricated at an argon pressure of 100 Pa had a high porosity and a low light reflectance in the 200–1400 nm wavelength range. In addition, it was shown that the growth of the thin film thickness was non-linear with respect to time, and the formation of a fuzz-like structure may be influenced by particle diffusion in the gas phase and on the substrate.