Transfer-Printed Multiple GeSn Membrane Mid-Infrared Photodetectors

Due to their narrow band gap and compatibility with silicon processing, germanium-tin (Ge<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{1-x}$</tex-math></inline-formula>Sn<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{x}$</tex-math></inline-formula>) alloys are a versatile platform for scalable integrated mid-infrared photonics. These semiconductors are typically grown on silicon wafers using Ge as an interlayer. However, the large lattice mismatch in this heteroepitaxy protocol leads to the build-up of compressive strain in the grown layers. This compressive strain limits the material quality and its thermal stability besides expanding the band gap, thereby increasing the Sn content needed to cover a broader range in the mid-infrared. Released Ge<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{1-x}$</tex-math></inline-formula>Sn<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{x}$</tex-math></inline-formula> membranes provide an effective way to mitigate these harmful effects of the epitaxial strain and control the band gap energy while enabling the hybrid integration onto different substrates. Nevertheless, the epitaxial strain is also known to affect the fabrication of membrane devices due to a significant bowing upon release from the growth substrate, especially in high Sn content structures. With this perspective, herein these limitations are discussed and addressed by introducing bow-free, strain-relaxed Ge<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{1-x}$</tex-math></inline-formula>Sn<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{x}$</tex-math></inline-formula> membranes in the fabrication of mid-infrared devices. These devices are transfer-printed with metal contacts to create multiple photodetectors in a single transfer step. The resulting photodetectors exhibit an extended photodetection cutoff reaching a wavelength of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$3.1 \,\mu$</tex-math></inline-formula>m for a Sn content of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">${x=0.11}$</tex-math></inline-formula> compared to as-grown photoconductive devices. The latter yields a reduced cutoff of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$2.8 \,\mu$</tex-math></inline-formula>m due to the inherent compressive strain. Additionally, a significant reduction in the dark current of two orders of magnitude is observed, which could be related to the formation of a Schottky barrier or to a change in the contact resistivity during the processing steps of the membranes. Furthermore, the impact of chemical treatment and annealing on the device performance was also investigated showing a further reduction in the dark current. The demonstrated transfer printing, along with the use of an adhesive layer, allows the transfer of multiple GeSn membranes onto virtually any substrate. This approach paves the way for scalable fabrication of hybrid optoelectronic devices leveraging the tunable band gap of Ge<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{1-x}$</tex-math></inline-formula>Sn<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{x}$</tex-math></inline-formula> in the mid-infrared range.

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Publication Details

Journal
IEEE Journal of Selected Topics in Quantum Electronics
Published
2024-08-26
DOI
https://doi.org/10.1109/jstqe.2024.3450302
Citations
4
Primary Topic
Photonic and Optical Devices
Type
article
Field-Weighted Citation Impact
0.83

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article

Transfer-Printed Multiple GeSn Membrane Mid-Infrared Photodetectors

Mahmoud R. M. Atalla, Julien Brodeur, Simone Assali, Stéphane Kéna‐Cohen et al.
4 citations
IEEE Journal of Selected Topics in Quantum Electronics
Photonic and Optical Devices
0.83
article

Transfer-Printed Multiple GeSn Membrane Mid-Infrared Photodetectors

Mahmoud R. M. Atalla, Julien Brodeur, Simone Assali, Stéphane Kéna‐Cohen, Patrick Daoust, Lu Luo, Sebastian Koelling, Yves-Alain Peter, Cédric Lemieux‐Leduc, Gérard Daligou, Oussama Moutanabbir
article en
4 citations

Abstract

Due to their narrow band gap and compatibility with silicon processing, germanium-tin (Ge<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{1-x}$</tex-math></inline-formula>Sn<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{x}$</tex-math></inline-formula>) alloys are a versatile platform for scalable integrated mid-infrared photonics. These semiconductors are typically grown on silicon wafers using Ge as an interlayer. However, the large lattice mismatch in this heteroepitaxy protocol leads to the build-up of compressive strain in the grown layers. This compressive strain limits the material quality and its thermal stability besides expanding the band gap, thereby increasing the Sn content needed to cover a broader range in the mid-infrared. Released Ge<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{1-x}$</tex-math></inline-formula>Sn<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{x}$</tex-math></inline-formula> membranes provide an effective way to mitigate these harmful effects of the epitaxial strain and control the band gap energy while enabling the hybrid integration onto different substrates. Nevertheless, the epitaxial strain is also known to affect the fabrication of membrane devices due to a significant bowing upon release from the growth substrate, especially in high Sn content structures. With this perspective, herein these limitations are discussed and addressed by introducing bow-free, strain-relaxed Ge<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{1-x}$</tex-math></inline-formula>Sn<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{x}$</tex-math></inline-formula> membranes in the fabrication of mid-infrared devices. These devices are transfer-printed with metal contacts to create multiple photodetectors in a single transfer step. The resulting photodetectors exhibit an extended photodetection cutoff reaching a wavelength of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$3.1 \,\mu$</tex-math></inline-formula>m for a Sn content of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">${x=0.11}$</tex-math></inline-formula> compared to as-grown photoconductive devices. The latter yields a reduced cutoff of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$2.8 \,\mu$</tex-math></inline-formula>m due to the inherent compressive strain. Additionally, a significant reduction in the dark current of two orders of magnitude is observed, which could be related to the formation of a Schottky barrier or to a change in the contact resistivity during the processing steps of the membranes. Furthermore, the impact of chemical treatment and annealing on the device performance was also investigated showing a further reduction in the dark current. The demonstrated transfer printing, along with the use of an adhesive layer, allows the transfer of multiple GeSn membranes onto virtually any substrate. This approach paves the way for scalable fabrication of hybrid optoelectronic devices leveraging the tunable band gap of Ge<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{1-x}$</tex-math></inline-formula>Sn<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$_{x}$</tex-math></inline-formula> in the mid-infrared range.

IEEE Journal of Selected Topics in Quantum ElectronicsVol. 31(1: SiGeSn Infrared Photon. and)
Canada Foundation for Innovation, Canada Research Chairs, Mitacs, Natural Sciences and Engineering Research Council of Canada, Air Force Office of Scientific Research, Army Research Office
Affordable and clean energy
Openalex Percentile: Top 27%
Photonic and Optical Devices
0.83
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