Recent advancements of multibeam mask writer MBM-3000
The multi-beam mask writer MBM-3000 designed to achieve N2 device technology node was released. The key concepts of the MBM-3000 are compatible with better resolution and faster throughput than our current multi-beam writer MBM- 2000PLUS. In order to reach these objective, the MBM-3000 is equipped with 12-nm beamlets, a single powerful electron source, a new optics design and enhanced data path systems. The smaller beamlets produce improved resolution and decreased productivity. However, the powerful cathode, which outputs a beam current density of 3.6A/cm<sup>2</sup>, prevent declined throughput. The new optics systems and enhanced data path support both the better resolution and the throughput.
Authors
- Jumpei Yasuda (ORCID: https://orcid.org/0009-0005-7039-2075)
- Hiroshi Yamashita (ORCID: https://orcid.org/0000-0001-7731-2473)
- Tomoo Motosugi
- Noriaki Nakayamada
- Masato Saito (ORCID: https://orcid.org/0009-0003-7436-7446)
- Hayato Kimura
- Hiroshi Matsumoto
- Michihiro Kawaguchi
- M Oshiro
- Yoshinori Kojima
Publication Details
- Published
- 2024-08-26
- DOI
- https://doi.org/10.1117/12.3034396
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00