A proof of concept for hybrid nano-imprint lithography

Nano-imprint lithography (NIL) offers unique advantages, such as the ability to achieve patterning at 1x nm, threedimensional patterning, and low energy consumption. The throughput of NIL using a spin-coating resist has been able to exceed 120 wph. However, spin-coating NIL faces the issue of varying residual film under the resist pattern depending on the pattern density. To address this problem, we propose a hybrid NIL (HB-NIL) that combines spin-coating NIL with jet and flash imprint lithography. In this paper, we will present the results of evaluating the patterning performance of HB-NIL and discuss its feasibility based on the experimental findings.