The Minimum Specific On-Resistance of 4H-SiC Superjunction Devices

This brief presents the minimum specific on-resistance <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\min ,\text {SiC}}$ </tex-math></inline-formula> of balanced symmetric 4H-silicon carbide superjunction (4H-SiC SJ) devices based on the resistance well (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">R</i>-well) model. The <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">R</i>-well of 4H-SiC SJ is modified by considering both the anisotropy of impact ionization in the off-state and carrier incomplete ionization and JFET effect under the on-state conditions. Compared with the conventional model that only considers the breakdown voltage <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {B}}$ </tex-math></inline-formula> design In the<sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</small>-state, <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\min ,\text {SiC}}$ </tex-math></inline-formula> optimization achieves the minimum specific on-resistance <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on},\text {sp}}$ </tex-math></inline-formula> in shorter SJ length and lower SJ doping concentration, resulting in reduced process complexity and wider process tolerance. Based on this study, a new <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on},\text {sp}}~\propto ~{V}_{\text {B}}$ </tex-math></inline-formula> relationship and corresponding design formula are obtained for 4H-SiC SJ. It is shown that <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\min ,\text {SiC}}$ </tex-math></inline-formula> optimization has the potential to significantly improve the reported <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on},\text {sp}}$ </tex-math></inline-formula> characteristics by 77%–92% at the same <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {B}}$ </tex-math></inline-formula>, providing a significant margin for further optimization.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2024-08-20
DOI
https://doi.org/10.1109/ted.2024.3441561
Citations
3
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
0.63

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article

The Minimum Specific On-Resistance of 4H-SiC Superjunction Devices

Ming Qiao, Bo Zhang, Yuting Liu, Teng Liu et al.
3 citations
IEEE Transactions on Electron Devices
Silicon Carbide Semiconductor Technologies
0.63
article

The Minimum Specific On-Resistance of 4H-SiC Superjunction Devices

Ming Qiao, Bo Zhang, Yuting Liu, Teng Liu, Wentong Zhang, Zhaoji Li, Hongbo Li
article en
3 citations

Abstract

This brief presents the minimum specific on-resistance <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\min ,\text {SiC}}$ </tex-math></inline-formula> of balanced symmetric 4H-silicon carbide superjunction (4H-SiC SJ) devices based on the resistance well (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">R</i>-well) model. The <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">R</i>-well of 4H-SiC SJ is modified by considering both the anisotropy of impact ionization in the off-state and carrier incomplete ionization and JFET effect under the on-state conditions. Compared with the conventional model that only considers the breakdown voltage <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {B}}$ </tex-math></inline-formula> design In the<sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</small>-state, <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\min ,\text {SiC}}$ </tex-math></inline-formula> optimization achieves the minimum specific on-resistance <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on},\text {sp}}$ </tex-math></inline-formula> in shorter SJ length and lower SJ doping concentration, resulting in reduced process complexity and wider process tolerance. Based on this study, a new <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on},\text {sp}}~\propto ~{V}_{\text {B}}$ </tex-math></inline-formula> relationship and corresponding design formula are obtained for 4H-SiC SJ. It is shown that <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\min ,\text {SiC}}$ </tex-math></inline-formula> optimization has the potential to significantly improve the reported <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on},\text {sp}}$ </tex-math></inline-formula> characteristics by 77%–92% at the same <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {B}}$ </tex-math></inline-formula>, providing a significant margin for further optimization.

IEEE Transactions on Electron DevicesVol. 71(10)
University of Electronic Science and Technology of China (CN), Shenzhen Institute of Information Technology (CN), National Engineering Research Center of Electromagnetic Radiation Control Materials (CN)
National Natural Science Foundation of China
Reduced inequalities
Openalex Percentile: Top 32%
Silicon Carbide Semiconductor Technologies
0.63
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