The Minimum Specific On-Resistance of 4H-SiC Superjunction Devices
This brief presents the minimum specific on-resistance <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\min ,\text {SiC}}$ </tex-math></inline-formula> of balanced symmetric 4H-silicon carbide superjunction (4H-SiC SJ) devices based on the resistance well (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">R</i>-well) model. The <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">R</i>-well of 4H-SiC SJ is modified by considering both the anisotropy of impact ionization in the off-state and carrier incomplete ionization and JFET effect under the on-state conditions. Compared with the conventional model that only considers the breakdown voltage <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {B}}$ </tex-math></inline-formula> design In the<sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</small>-state, <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\min ,\text {SiC}}$ </tex-math></inline-formula> optimization achieves the minimum specific on-resistance <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on},\text {sp}}$ </tex-math></inline-formula> in shorter SJ length and lower SJ doping concentration, resulting in reduced process complexity and wider process tolerance. Based on this study, a new <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on},\text {sp}}~\propto ~{V}_{\text {B}}$ </tex-math></inline-formula> relationship and corresponding design formula are obtained for 4H-SiC SJ. It is shown that <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\min ,\text {SiC}}$ </tex-math></inline-formula> optimization has the potential to significantly improve the reported <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on},\text {sp}}$ </tex-math></inline-formula> characteristics by 77%–92% at the same <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {B}}$ </tex-math></inline-formula>, providing a significant margin for further optimization.
Authors
- Ming Qiao (ORCID: https://orcid.org/0000-0001-6325-9878)
- Bo Zhang (ORCID: https://orcid.org/0000-0003-1288-1549)
- Yuting Liu (ORCID: https://orcid.org/0009-0005-6676-0226)
- Teng Liu (ORCID: https://orcid.org/0000-0001-5862-0518)
- Wentong Zhang (ORCID: https://orcid.org/0000-0001-9221-3318)
- Zhaoji Li (ORCID: https://orcid.org/0000-0002-2478-8897)
- Hongbo Li (ORCID: https://orcid.org/0000-0003-4410-586X)
Institutions
- University of Electronic Science and Technology of China (CN)
- Shenzhen Institute of Information Technology (CN)
- National Engineering Research Center of Electromagnetic Radiation Control Materials (CN)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2024-08-20
- DOI
- https://doi.org/10.1109/ted.2024.3441561
- Citations
- 3
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.63
Funders
- National Natural Science Foundation of China