Effect Evaluation and Modeling of p-Type Contact and p-Well Sheet Resistance of SiC MOSFET with Respect to Switching Characteristics
SiC metal-oxide-semiconductor field-effect transistors (MOSFETs) exhibit excellent high-speed switching characteristics. However, the sheet resistance of the p-body region and the contact resistance between the p-body region and source electrode significantly degrade the switching performance. In this study, to clarify the effect of resistance on switching speed, which has not been sufficiently explored before, we used the temperature dependence of sheet and contact resistance and conducted switching tests under different temperature conditions. Furthermore, we created a circuit model that considered body effects and compared the results of the models with the measurements. We were able to reproduce the same temperature and resistance dependences as those exhibited by the experimental results, thus confirming the effectiveness of the model.
Authors
- Takaaki Tominaga (ORCID: https://orcid.org/0000-0002-9458-9578)
- Shuhei Nakata (ORCID: https://orcid.org/0000-0002-7572-4949)
- Yui Nagase
Institutions
- Kanazawa Institute of Technology (JP)
- Mitsubishi Electric (Japan) (JP)
- Mitsubishi Electric (United States) (US)
Publication Details
- Journal
- Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
- Published
- 2024-08-23
- DOI
- https://doi.org/10.4028/p-n20uud
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00