Feature Extraction From Diffraction Images Using a Spatial Light Modulator in Scatterometry

The continuous miniaturization of semiconductor devices has increased the demand for advanced process control technologies. This process requires real-time measurement systems to monitor manufacturing parameters to ensure efficiency and high quality. This study introduces a novel optical module that uses a spatial light modulator to extract key-point intensity distributions from diffraction images in scatterometry. The efficacy of this method is demonstrated on a grating target with a pitch of 855 nm using a feature extraction algorithm that identifies key point locations based on calculated diffraction images. A particularly designed off-axis extraction pattern facilitates the acquisition of key-point intensity distributions. Moreover, incorporating a cylindrical lens into the optical setup reduces the image feature dimensionality, thereby decreasing the data storage space and enabling the output in a streamlined vector format conducive to further analysis. Experimental data on the development of this scatterometry-based optical module and the subsequent validation of the key-point extraction method indicate a maximum mean absolute error of 0.0080 and a cosine similarity consistently above 0.9999. This study integrates image analysis and measurement techniques by optics, providing a more efficient pathway for key-point extraction in diffraction images, offering the potential for improving real-time process monitoring in the semiconductor manufacturing industry.