Influence of SiO2 Nanoparticles Extracted from Biomass on the Properties of Electrodeposited Ni Matrix Composite Films on Si(100) Substrate

Lab-made biosilica (SiO<sub>2</sub>) nanoparticles were obtained from waste biomass (rice husks) and used as eco-friendly fillers in the production of nickel matrix composite films via the co-electrodeposition technique. The produced biosilica nanoparticles were characterized using XRD, FTIR, and FE-SEM/EDS. Amorphous nano-sized biosilica particles with a high SiO<sub>2</sub> content were obtained. Various current regimes of electrodeposition, such as direct current (DC), pulsating current (PC), and reversing current (RC) regimes, were applied for the fabrication of Ni and Ni/SiO<sub>2</sub> films from a sulfamate electrolyte. Ni films electrodeposited with or without 1.0 wt.% biosilica nanoparticles in the electrolyte were characterized using FE-SEM/EDS (morphology/elemental analyses, roundness), AFM (roughness), Vickers microindentation (microhardness), and sheet resistance. Due to the incorporation of SiO<sub>2</sub> nanoparticles, the Ni/SiO<sub>2</sub> films were coarser than those obtained from the pure sulfamate electrolyte. The addition of SiO<sub>2</sub> to the sulfamate electrolyte also caused an increase in the roughness and electrical conductivity of the Ni films. The surface roughness values of the Ni/SiO<sub>2</sub> films were approximately 44.0%, 48.8%, and 68.3% larger than those obtained for the pure Ni films produced using the DC, PC, and RC regimes, respectively. The microhardness of the Ni and Ni/SiO<sub>2</sub> films was assessed using the Chen-Gao (C-G) composite hardness model, and it was shown that the obtained Ni/SiO<sub>2</sub> films had a higher hardness than the pure Ni films. Depending on the applied electrodeposition regime, the hardness of the Ni films increased from 29.1% for the Ni/SiO<sub>2</sub> films obtained using the PC regime to 95.5% for those obtained using the RC regime, reaching the maximal value of 6.880 GPa for the Ni/SiO<sub>2</sub> films produced using the RC regime.

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Journal
Materials
Published
2024-08-21
DOI
https://doi.org/10.3390/ma17164138
Citations
3
Primary Topic
Electrodeposition and Electroless Coatings
Type
article
Field-Weighted Citation Impact
0.63
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article

Influence of SiO2 Nanoparticles Extracted from Biomass on the Properties of Electrodeposited Ni Matrix Composite Films on Si(100) Substrate

Nebojša D. Nikolić, Dana Vasiljević-Radović, Željko Radovanović, Vladislav Jovanov et al.
3 citations
Materials
Electrodeposition and Electroless Coatings
0.63
article

Influence of SiO2 Nanoparticles Extracted from Biomass on the Properties of Electrodeposited Ni Matrix Composite Films on Si(100) Substrate

Nebojša D. Nikolić, Dana Vasiljević-Radović, Željko Radovanović, Vladislav Jovanov, Marija M. Vuksanović, Ivana O. Mladenović, Marko Obradov
article en
3 citations

Abstract

Lab-made biosilica (SiO<sub>2</sub>) nanoparticles were obtained from waste biomass (rice husks) and used as eco-friendly fillers in the production of nickel matrix composite films via the co-electrodeposition technique. The produced biosilica nanoparticles were characterized using XRD, FTIR, and FE-SEM/EDS. Amorphous nano-sized biosilica particles with a high SiO<sub>2</sub> content were obtained. Various current regimes of electrodeposition, such as direct current (DC), pulsating current (PC), and reversing current (RC) regimes, were applied for the fabrication of Ni and Ni/SiO<sub>2</sub> films from a sulfamate electrolyte. Ni films electrodeposited with or without 1.0 wt.% biosilica nanoparticles in the electrolyte were characterized using FE-SEM/EDS (morphology/elemental analyses, roundness), AFM (roughness), Vickers microindentation (microhardness), and sheet resistance. Due to the incorporation of SiO<sub>2</sub> nanoparticles, the Ni/SiO<sub>2</sub> films were coarser than those obtained from the pure sulfamate electrolyte. The addition of SiO<sub>2</sub> to the sulfamate electrolyte also caused an increase in the roughness and electrical conductivity of the Ni films. The surface roughness values of the Ni/SiO<sub>2</sub> films were approximately 44.0%, 48.8%, and 68.3% larger than those obtained for the pure Ni films produced using the DC, PC, and RC regimes, respectively. The microhardness of the Ni and Ni/SiO<sub>2</sub> films was assessed using the Chen-Gao (C-G) composite hardness model, and it was shown that the obtained Ni/SiO<sub>2</sub> films had a higher hardness than the pure Ni films. Depending on the applied electrodeposition regime, the hardness of the Ni films increased from 29.1% for the Ni/SiO<sub>2</sub> films obtained using the PC regime to 95.5% for those obtained using the RC regime, reaching the maximal value of 6.880 GPa for the Ni/SiO<sub>2</sub> films produced using the RC regime.

MaterialsVol. 17(16)
University of Belgrade (RS)
Openalex Percentile: Top 32%
Electrodeposition and Electroless Coatings
0.63
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