Matching Parameters for Vapor Deposition Process of Parylene C

Abstract DSC and DTG curves of Parylene C were determined by 5K/min, 10K/min, 15K/min, and 20K/min heating rates. The optimal sublimation temperature, cleavage temperature, polymerization temperation and pressure were obtained via DSC/DTG curves, thermodynamic theory and quantum chemical theory. It was constructed that are the dimer sublimation, cleavage and polymerization models. The process parameters were matched for Parylene C through the sublimation, cleavage and polymerization rate computing. Subsequently, the experiments were conducted to prove it. The result shows that the efficiency of film formation has significantly raised, such as the film formation rate increasing by 57%, and the film formation time was reduced by more than 50%; The film purity was lowerd accordingly, the film quantity was significantly raised.

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Publication Details

Journal
Journal of Physics Conference Series
Published
2024-08-01
DOI
https://doi.org/10.1088/1742-6596/2821/1/012003
Primary Topic
Neuroscience and Neural Engineering
Type
article
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Matching Parameters for Vapor Deposition Process of Parylene C

Zeng Xian-guang, Yu‐Ting Chen, Xiaogang Tong, Qiangqiang Liu
Journal of Physics Conference Series
Neuroscience and Neural Engineering
article

Matching Parameters for Vapor Deposition Process of Parylene C

Zeng Xian-guang, Yu‐Ting Chen, Xiaogang Tong, Qiangqiang Liu
article en

Abstract

Abstract DSC and DTG curves of Parylene C were determined by 5K/min, 10K/min, 15K/min, and 20K/min heating rates. The optimal sublimation temperature, cleavage temperature, polymerization temperation and pressure were obtained via DSC/DTG curves, thermodynamic theory and quantum chemical theory. It was constructed that are the dimer sublimation, cleavage and polymerization models. The process parameters were matched for Parylene C through the sublimation, cleavage and polymerization rate computing. Subsequently, the experiments were conducted to prove it. The result shows that the efficiency of film formation has significantly raised, such as the film formation rate increasing by 57%, and the film formation time was reduced by more than 50%; The film purity was lowerd accordingly, the film quantity was significantly raised.

Journal of Physics Conference SeriesVol. 2821(1)
Southwestern Institute of Physics (CN), Sichuan University of Science and Engineering (CN)
Openalex Percentile: Top 87%
Neuroscience and Neural Engineering
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Matching Parameters for Vapor Deposition Process of Parylene C — Zeng Xian-guang, Yu‐Ting Chen, et al. · Journal of Physics Conference Series (2024) | TGRS Research Map | TGRS