Heavy Boron-Doped Silicon Tunneling Inter-layer Enables Efficient Silicon Heterojunction Solar Cells

P-type hydrogenated nanocrystalline silicon (nc-Si:H) has been used as a hole-selective layer for efficient n-type crystalline silicon heterojunction (SHJ) solar cells. However, the presence of an additional valence band offset at the interface between intrinsic amorphous hydrogenated silicon and p-type nc-Si:H films will limit the hole carrier transportation. In this work, it has been found that when a heavily boron-doped silicon oxide layer deposited with high hydrogen dilution to silane (p<sub>B</sub>) was inserted into their interface, the fill factor of SHJ solar cells increases 3% absolutely because of the reduced valence band offset and the increased opportunity to provide a hopping tunnel assisted by the doping energy level and valence band tail states. Furthermore, the additional boron incorporation in intrinsic amorphous silicon adjacent to p<sub>B</sub> helps to enhance the built-in electric field, thus increasing the hole selectivity. By these means, the power conversion efficiency was improved from 23.9% to approximately 25%.

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Publication Details

Journal
ACS Applied Materials & Interfaces
Published
2024-08-22
DOI
https://doi.org/10.1021/acsami.4c07897
Citations
5
Primary Topic
Silicon and Solar Cell Technologies
Type
article
Field-Weighted Citation Impact
1.04

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article

Heavy Boron-Doped Silicon Tunneling Inter-layer Enables Efficient Silicon Heterojunction Solar Cells

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5 citations
ACS Applied Materials & Interfaces
Silicon and Solar Cell Technologies
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article

Heavy Boron-Doped Silicon Tunneling Inter-layer Enables Efficient Silicon Heterojunction Solar Cells

Yinuo Zhou, Guangyuan Wang, Shenglei Huang, Haoxin Fu, Wenjie Zhao, Anjun Han, Zhengxin Liu, Zhenfei Li, Wenzhu Liu, Liping Zhang, Qiang Shi, Bin Fan, Honghua Zhang, Junlin Du, Fanying Meng, Jianhua Shi
article en
5 citations

Abstract

P-type hydrogenated nanocrystalline silicon (nc-Si:H) has been used as a hole-selective layer for efficient n-type crystalline silicon heterojunction (SHJ) solar cells. However, the presence of an additional valence band offset at the interface between intrinsic amorphous hydrogenated silicon and p-type nc-Si:H films will limit the hole carrier transportation. In this work, it has been found that when a heavily boron-doped silicon oxide layer deposited with high hydrogen dilution to silane (p<sub>B</sub>) was inserted into their interface, the fill factor of SHJ solar cells increases 3% absolutely because of the reduced valence band offset and the increased opportunity to provide a hopping tunnel assisted by the doping energy level and valence band tail states. Furthermore, the additional boron incorporation in intrinsic amorphous silicon adjacent to p<sub>B</sub> helps to enhance the built-in electric field, thus increasing the hole selectivity. By these means, the power conversion efficiency was improved from 23.9% to approximately 25%.

ACS Applied Materials & InterfacesVol. 16(35)
Chinese Academy of Sciences (CN), ShanghaiTech University (CN), Shanghai Institute of Microsystem and Information Technology (CN), University of Chinese Academy of Sciences (CN)
National Natural Science Foundation of China, Science and Technology Commission of Shanghai Municipality, Shanghai Rising-Star Program, Chinese Academy of Sciences, Shanghai Branch, National Key Research and Development Program of China
Affordable and clean energy
Openalex Percentile: Top 23%
Silicon and Solar Cell Technologies
1.04
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