Robust optical picometrology through data diversity

Topologically structured light contains deeply subwavelength features, such as phase singularities, and the scattering of such light can therefore be sensitive to the geometry or movement of scattering objects at such scales. Indeed, it has been shown recently that single-shot optical measurements can yield positional precision better than 100 pm (less than one five-thousandth of the wavelength λ ) via a deep-learning-enabled analysis of scattering patterns. Measurement performance, and the extent to which it can be sustained, are constrained by the quality and depth of neural network training data and the stability of the experimental apparatus. Here, we show that a neural network can be trained through exposure to an extended envelope of instrumental/ambient noise conditions to robustly quantify picometric displacements of a target against orders-of-magnitude larger background fluctuations, to maintain precision and accuracy of 100–150 pm in optical measurements (at λ = 488 nm) of nanowire positional change. This capability opens up a range of application opportunities, for example in the optical study of nanostructural dynamics, stiction, material fatigue, and phase transitions.

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Institutions

Publication Details

Journal
Optical Materials Express
Published
2024-08-19
DOI
https://doi.org/10.1364/ome.531665
Citations
4
Primary Topic
Advanced Optical Sensing Technologies
Type
article
Field-Weighted Citation Impact
2.03

Funders

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article

Robust optical picometrology through data diversity

Nikolay I. Zheludev, Cheng-Hung Chi, Eric Plum, Kevin F. MacDonald
4 citations
Optical Materials Express
Advanced Optical Sensing Technologies
2.03
article

Robust optical picometrology through data diversity

Nikolay I. Zheludev, Cheng-Hung Chi, Eric Plum, Kevin F. MacDonald
article en
4 citations

Abstract

Topologically structured light contains deeply subwavelength features, such as phase singularities, and the scattering of such light can therefore be sensitive to the geometry or movement of scattering objects at such scales. Indeed, it has been shown recently that single-shot optical measurements can yield positional precision better than 100 pm (less than one five-thousandth of the wavelength λ ) via a deep-learning-enabled analysis of scattering patterns. Measurement performance, and the extent to which it can be sustained, are constrained by the quality and depth of neural network training data and the stability of the experimental apparatus. Here, we show that a neural network can be trained through exposure to an extended envelope of instrumental/ambient noise conditions to robustly quantify picometric displacements of a target against orders-of-magnitude larger background fluctuations, to maintain precision and accuracy of 100–150 pm in optical measurements (at λ = 488 nm) of nanowire positional change. This capability opens up a range of application opportunities, for example in the optical study of nanostructural dynamics, stiction, material fatigue, and phase transitions.

Optical Materials ExpressVol. 14(10)
Nanyang Technological University (SG), University of Southampton (GB)
National Research Foundation, National Research Foundation Singapore, Engineering and Physical Sciences Research Council
Openalex Percentile: Top 12%
Advanced Optical Sensing Technologies
2.03
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Robust optical picometrology through data diversity — Nikolay I. Zheludev, Cheng-Hung Chi, et al. · Optical Materials Express (2024) | TGRS Research Map | TGRS