Threshold Voltage Modulation Strategies for ZnO TFT and Enhanced Performance of Depletion-Mode Inverters

Abstract This work presents the analysis and comparison of the adjustment mechanism and electrical characteristics of the depletion-mode transistors fabricated by the three threshold modulation methods. the electrical performance test of the depletion-mode inverter composed of each depletion-mode TFTs is completed, among which, the depletion transistor fabricated by electron beam evaporation of 100 nm AL as the gate material has excellent performance, with a switching ratio of 108, a subthreshold swing of 281 mV/dec, and a turn-on voltage adjusted from 0 V to -6.8 V, which has the advantages of strong device stability and good negative modulation. the output current of the depletion inverter composed of the AL gate is up to the μA level. excellent driving capability is shown, A foundation is established for the subsequent construction of complex circuits based on zinc oxide thin-film transistors.

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Publication Details

Journal
Journal of Physics Conference Series
Published
2024-08-01
DOI
https://doi.org/10.1088/1742-6596/2809/1/012055
Primary Topic
Thin-Film Transistor Technologies
Type
article
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article

Threshold Voltage Modulation Strategies for ZnO TFT and Enhanced Performance of Depletion-Mode Inverters

Liangpei Wang, Zhi Ye, Ze Yuan, Tianfeng Huang et al.
Journal of Physics Conference Series
Thin-Film Transistor Technologies
article

Threshold Voltage Modulation Strategies for ZnO TFT and Enhanced Performance of Depletion-Mode Inverters

Liangpei Wang, Zhi Ye, Ze Yuan, Tianfeng Huang, Junfeng Zhang, Shangcong Luo, Chenyu Wang
article en

Abstract

Abstract This work presents the analysis and comparison of the adjustment mechanism and electrical characteristics of the depletion-mode transistors fabricated by the three threshold modulation methods. the electrical performance test of the depletion-mode inverter composed of each depletion-mode TFTs is completed, among which, the depletion transistor fabricated by electron beam evaporation of 100 nm AL as the gate material has excellent performance, with a switching ratio of 108, a subthreshold swing of 281 mV/dec, and a turn-on voltage adjusted from 0 V to -6.8 V, which has the advantages of strong device stability and good negative modulation. the output current of the depletion inverter composed of the AL gate is up to the μA level. excellent driving capability is shown, A foundation is established for the subsequent construction of complex circuits based on zinc oxide thin-film transistors.

Journal of Physics Conference SeriesVol. 2809(1)
Zhejiang University (CN)
Affordable and clean energy
Openalex Percentile: Top 90%
Thin-Film Transistor Technologies
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