Dynamic flat field correction in edge illumination imaging

Edge Illumination (EI) X-ray phase contrast imaging (XPCI) is a promising technique that, next to conventional attenuation contrast, provides phase contrast and dark field contrast. Opposed to conventional x-ray imaging though, EI-XPCI is more vulnerable to focal spot drifts, leading to intensity changes in the acquired projections. As a result, attenuation, phase, and dark field contrast parameters that are estimated from these projections also suffer from these variations. In this work, through accurate phase contrast simulations using the recently developed CAD-ASTRA toolbox, we study the effect of the focal spot drifts on EI-XPCI parameter estimation. These variations are then modeled by computing eigen flat fields (EFFs). Subsequently, the EFFs are used to normalize the projections corresponding to each phase step of an EI-XPCI acquisition. Results indicate that dynamic flat field correction (FFC) based on EFFs outperforms conventional FFC in EI-XPCI.

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Publication Details

Published
2024-08-13
DOI
https://doi.org/10.1117/12.3028319
Citations
1
Primary Topic
Optical Systems and Laser Technology
Type
article
Field-Weighted Citation Impact
0.21
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Dynamic flat field correction in edge illumination imaging

Jan De Beenhouwer, Nicholas Francken, Ben Huyge, Jan Sijbers et al.
1 citations
Optical Systems and Laser Technology
0.21
article

Dynamic flat field correction in edge illumination imaging

Jan De Beenhouwer, Nicholas Francken, Ben Huyge, Jan Sijbers, Ziya Merdan, Didem Gökbel Keklikoğlu
article en
1 citations

Abstract

Edge Illumination (EI) X-ray phase contrast imaging (XPCI) is a promising technique that, next to conventional attenuation contrast, provides phase contrast and dark field contrast. Opposed to conventional x-ray imaging though, EI-XPCI is more vulnerable to focal spot drifts, leading to intensity changes in the acquired projections. As a result, attenuation, phase, and dark field contrast parameters that are estimated from these projections also suffer from these variations. In this work, through accurate phase contrast simulations using the recently developed CAD-ASTRA toolbox, we study the effect of the focal spot drifts on EI-XPCI parameter estimation. These variations are then modeled by computing eigen flat fields (EFFs). Subsequently, the EFFs are used to normalize the projections corresponding to each phase step of an EI-XPCI acquisition. Results indicate that dynamic flat field correction (FFC) based on EFFs outperforms conventional FFC in EI-XPCI.

University of Antwerp (BE), Gazi University (TR)
Openalex Percentile: Top 49%
Optical Systems and Laser Technology
0.21
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