Atomistic Simulation Studies of Na4SiO4

Tetrasodium silicate (Na4SiO4) has emerged as a promising candidate for battery applications due to its favorable ionic transport properties. Atomic-scale simulations employing classical pair potentials have elucidated the defect mechanisms and ion migration dynamics in Na4SiO4. The Na Frenkel defect, characterized by the creation of a Na vacancy and an interstitial Na⁺ ion, is identified as the most energetically favorable defect process, facilitating efficient vacancy-assisted Na⁺ ion migration. This process results in three-dimensional ion diffusion with a low activation energy of 0.55 eV, indicating rapid ion movement within the material. Among monovalent dopants (Li⁺, K⁺, and Rb⁺), K⁺ was found to be the most advantageous for substitution on the Na site. For trivalent doping, Al is the most favorable on the Si site, generating additional Na⁺ ions and potentially enhancing ionic conductivity. Ge was identified as a promising isovalent dopant for the Si site. These theoretical findings suggest that Na4SiO4 could offer high ionic conductivity and stability when optimized through appropriate doping. Experimental validation of these predictions could lead to the development of advanced battery materials with improved performance and durability.