X‐Ray Multibeam Ptychography at up to 20 keV: Nano‐Lithography Enhances X‐Ray Nano‐Imaging (Adv. Sci. 30/2024)
Authors
- Ken Vidar Falch (ORCID: https://orcid.org/0009-0009-8232-8168)
- Thomas L. Sheppard (ORCID: https://orcid.org/0000-0002-8891-985X)
- Mikhail Lyubomirskiy (ORCID: https://orcid.org/0000-0002-3525-0320)
- Maik Kahnt (ORCID: https://orcid.org/0000-0003-4332-1202)
- Martin Wegener (ORCID: https://orcid.org/0000-0002-9770-2441)
- Roman Zvagelsky (ORCID: https://orcid.org/0000-0001-9435-2477)
- Pablo Villanueva‐Perez (ORCID: https://orcid.org/0000-0002-4671-790X)
- Tang Li (ORCID: https://orcid.org/0000-0002-3344-7277)
- Runqing Yang
Publication Details
- Journal
- Advanced Science
- Published
- 2024-08-01
- DOI
- https://doi.org/10.1002/advs.202470179
- Citations
- 1
- Primary Topic
- Advanced X-ray Imaging Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.61